Abstract
Semiconducting nanowires are emerging as a route to combine heavily mismatched materials. The high level of control on wire dimensions and chemical composition makes them promising materials to be integrated in future silicon technologies as well as to be the active element in optoelectronic devices.
This ar ticle reviews the recent progress in epitaxial growth of nanowires on non-corresponding substrates. We highlight the advantage of using small dimensions to facilitate accommodation of the lattice strain at the surface of the structures. More specifically, we will focus on the growth of III-V nanowires on Group IV substrates. This approach enables the integration of high-perform ance III-V semiconductors monolithically into mature silicon technology, since fundamental issues of III-V integration on Si such as lattice and thermal expansion mismatch can be overcome. Moreover, as there will only be one nucleation site per crystallite, the system will not suffer from antiphase boundaries.
Issues that affect the electronic properties of the heterojunction, such as the crystallographic quality and diffusion of elements across the heterointerface, will be discussed. Finally, we address potential applications of vertical III-V nanowires grown on silicon.
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References
R.S. Wagner and W.C. Ellis, Appl. Phys. Lett. 4 (1964) p. 89.
K. Hiruma, H. Murakoshi, M. Yazawa, and T. Katsuyama, J. Cryst. Growth 163 (1996) p. 226.
M.T. Björk, B.J. Ohlsson, T. Sass, A.I. Persson, C. Thelander, M.H. Magnusson, K. Deppert, L.R. Wallenberg, and L. Samuelson, Appl. Phys. Lett. 80 (2002) p. 1058.
Y. Wu, R. Fan, and P. Yang, Nano Lett. 2 (2002) p. 83.
M.S. Gudiksen, L.J. Lauhon, J. Wang, D.C. Smith, and C.M. Lieber, Nature 415 (2002) p. 617.
M.A. Verheijen, G. Immink, T. deSmet, M.T. Borgström, and E.P.A.M. Bakkers, J. Am. Chem. Soc. 128 (2006) p. 1353.
L.J. Lauhon, M.S. Gudiksen, D. Wang, and C.M. Lieber, Nature 420 (2002) p. 57.
J. Goldberger, R. He, Y. Zhang, S. Lee, H. Yan, H.-J. Choi, and P. Yang, Nature 422 (2003) p. 599.
J. Hu, Y. Bando, Z. Liu, T. Sekiguchi, D. Goldberg, and J. Zhan, J. Am. Chem. Soc. 125 (2003) p. 11306.
O. Hayden, A.B. Greytak, and D.C. Bell, Adv. Mater. 17 (2005) p. 701.
F. Qian, S. Gradecak, Y. Li, C.-Y. Wen, and C.M. Lieber, Nano Lett. 5 (2005) p. 2287.
E. Ertekin, P.A. Greaney, T.D. Sands, and D.C. Chrzan, in Mater. Res. Soc. Symp. Proc. 737 (2003) F10.4.1–6.
M. Zervos and L.F. Feiner, J. Appl. Phys. 95 (2004) p. 281.
R.S. Wagner, in Whisker Technology, edited by A.B. Levitt (Wiley Interscience, New York, 1970) p. 47.
E.I. Givargizov, J. Cryst. Growth 20 (1973) p. 217.
E.I. Givargizov, J. Cryst. Growth 31 (1975) p. 20.
E.I. Givargizov, J. Vac. Sci. Technol. B 11 (1993) p. 449.
M. Yazawa, M. Koguchi, and K. Hiruma, Appl. Phys. Lett. 58 (1991) p. 1080.
K. Hiruma, M. Yazawa, T. Katsuyama, K. Ogawa, K. Haraguchi, M. Koguchi, and H. Kakibayashi, J. Appl. Phys. 77 (1995) p. 447.
T.I. Kamins, X. Li, R.S. Williams, and X. Liu, Nano Lett. 4 (2004) p. 503.
J.W. Dailey, J. Taraci, T. Clement, D.J. Smith, J. Drucker, and S.T. Picraux, J. Appl. Phys. 96
M.H. Huang, S. Mao, H. Feick, H. Yan, Y. Wu, H. Kind, E. Weber, R. Russo, and P. Yang, Science 292 (2001) p. 1897.
Z. Zhong, F. Qian, D. Wang, and C.M. Lieber, Nano Lett. 3 (2003) p. 343.
T. Kuykendall, P.J. Pauzauski, Y. Zhang, J. Goldberger, D. Sirbuly, J. Denlinger, and P. Yang, Nature Mater. 3 (2004) p. 524.
Y.F. Chan, X.F. Duan, S.K. Chan, I.K. Sou, X.X. Zhang, and N. Wang, Appl. Phys. Lett. 83 (2003) p. 2665.
T. Mårtensson, C.P.T. Svensson, B.A. Wacaser, M.W. Larsson, W. Seifert, K. Deppert, A. Gustafsson, L.R. Wallenberg, and L. Samuelson, Nano Lett. 4 (2004) p. 1987.
A.L. Roest, M.A. Verheijen, O. Wunnicke, S. Serafin, H. Wondergem, and E.P.A.M. Bakkers, Nanotechnology 17 (2006) p. S271.
M.A. Verheijen, E.P.A.M. Bakkers, A.R. Balkenende, A.L. Roest, M.M.H. Wagemans, M. Kaiser, H.J. Wondergem, and P.C.J. Graat, in Proc. MSM XIV: Microscopy of Semiconducting Materials, Springer Proc. Physics, Vol. 107, edited by A.G. Cullis and J.L. Hutchison (2005) p. 295.
E.P.A.M. Bakkers, J.A. Van Dam, S. De Franceschi, L.P. Kouwenhoven, M. Kaiser, M. Verheijen, H. Wondergem, and P. Van der Sluis, Nature Mater. 3 (2004) p. 769.
G.A. Bootsma and H. Gassen, J. Cryst. Growth 10 (1971) p. 223.
L. Schubert, P. Werner, N.D. Zakharov, G. Gerth, F.M. Kolb, L. Long, U. Gösele, and T.Y. Tan, Appl. Phys. Lett. 84 (2004) p. 4968.
R. Calarco, M. Marso, T. Richter, A.I. Aykanat, R. Meijers, A.V.D. Hart, T. Stoica, and H. Lüth, Nano Lett. 5 (2005) p. 981.
Y. Ohno, T. Shirahama, S. Takeda, A. Ishizumi, and Y. Kanemitsu, Appl. Phys. Lett. 87 (2005) p. 43105.
M.C. Plante and R.R. LaPierre, J. Cryst. Growth 286 (2006) p. 394.
M.T. Bjork, B.J. Ohlsson, T. Sass, A.I. Persson, C. Thelander, M.H. Magnusson, K. Deppert, L.R. Wallenberg, and L. Samuelson, Appl. Phys. Lett. 80 (2002) p. 1058.
A.M. Morales and C.M. Lieber, Science 279 (1998) p. 208.
Y.F. Zhang, Y.H. Tang, N. Wang, D.P. Yu, C.S. Lee, I. Bello, and S.T. Lee, Appl. Phys. Lett. 72 (1998) p. 1835.
X. Duan and C.M. Lieber, Adv. Mater. 12 (2000) p. 298.
E.P.A.M. Bakkers and M.A. Verheijen, J. Am. Chem. Soc. 125 (2003) p. 3440.
D.D.D. Ma, C.S. Lee, F.C.K. Au, S.Y. Tong, and S.T. Lee, Science 299 (2003) p. 1874.
T.I. Kamins, R.S. Williams, D.P. Basile, T. Hesjedal, and J.S. Harris, J. Appl. Phys. 89 (2001) p. 1008.
A. Hiraki, E. Lugujjo, and J.W. Mayer, J. Appl. Phys. 43 (1972) p. 3643.
A.M. Cassell, N.R. Franklin, T.W. Tombler, E.M. Chan, J. Han, and H. Dai, J. Am. Chem. Soc. 121 (1999) p. 7975.
S. Huang, X. Cai, and J. Liu, J. Am. Chem. Soc. 125 (2003) p. 5636.
L. Gangloff, E. Minoux, K.B.K. Teo, P. Vincent, V. Semet, V.T. Binh, M.H. Yang, I.Y.Y. Bu, R.G. Lacerda, G. Pirio, J.P. Schnell, D. Pribat, D.G. Hasko, G.A.J. Amaratunga, W.I. Milne, and P. Legagneux, Nano Lett. 4 (2004) p. 1575.
U. Krishnamachari, M.T. Borgström, B.J. Ohlsson, N. Panev, L. Samuelson, W. Seifert, M.W. Larsson, and L.R. Wallenberg, Appl. Phys. Lett. 85 (2004) p. 2077.
Z. Ikonic, G.P. Srivastava, and J.C. Inkson, Phys. Rev. B. 52 (1995) p. 14078.
J.H. Westbrook, ed., Moffatt’s Handbook of Binary Phase Diagrams (Genium Group, New York, 2004).
D.R. Lide, ed., Handbook of Chemistry and Physics (CRC Press, Boca Raton, Fla., 1995).
W. Scott and R.J. Hager, J. Electron. Mater. 8 (1979) p. 581.
S.F. Fang, K. Adomi, S. Iyer, H. Morkoc, H. Zabel, C. Choi, and N. Otsuka, J. Appl. Phys. 68 (1990) p. R31.
O. Hayden, R. Agarwal, and C.M. Lieber, Nature Mater. 5 (2006) p. 352.
Y. Cui, Q. Wei, H. Park, and C.M. Lieber, Science 293 (2001) p. 1289.
R.F. Service, Science 306 (2004) p. 806.
M. Law, L.E. Greene, J.C. Johnson, R. Saykally, and P. Yang, Nature Mater. 4 (2005) p. 455.
X. Duan, Y. Huang, Y. Cui, J. Wang, and C.M. Lieber, Nature 409 (2001) p. 66.
M.H.M. van Weert, O. Wunnicke, A.L. Roest, T.J. Eijkemans, A. Yu Silov, J.E.M. Haverkort, G.W. ‘t Hooft, and E.P.A.M. Bakkers, Appl. Phys. Lett. 88 043109 (2006).
H.S.P. Wong, IBM J. Res. Dev. 46 (2002) p. 133.
Y.-J. Doh, J.A. van Dam, A.L. Roest, E.P.A.M. Bakkers, L.P. Kouwenhoven, and S. De Franceschi, Science 309 (2005) p. 272.
J.A. van Dam, Y.V. Nazarov, E.P.A.M. Bakkers, S. De Franceschi, and L.P. Kouwenhoven, Nature 442 (2006) p. 667.
T. Bryllert, L.-E. Wernersson, L.E. Fröberg, and L. Samuelson, IEEE Electron Dev. Lett. 27 (2006) p. 323.
L.K. van Vugt, S.J. Veen, E.P.A.M. Bakkers, A.L. Roest, and D. Vanmaekelbergh, J. Am. Chem. Soc. 127 (2005) p. 12357.
H.T. Ng, J. Han, T. Yamada, P. Nguyen, Y.P. Chen, and M. Meyyappan, Nano Lett. 4 (2004) p. 1247.
J. Goldberger, A.I. Hochbaum, R. Fan, and P. Yang, Nano Lett. 5 (2006) p. 973.
V. Schmidt, H. Riel, S. Senz, S. Karg, W. Riess, and U. Gösele, Small 2 (2006) p. 85.
W. Seifert, M. Borgström, K. Deppert, K.A. Dick, J. Johansson, M.W. Larsson, T. Mårtensson, N. Sköld, C.P.T. Svensson, B.A. Wacaser, L.R. Wallenberg, and L. Samuelson, J. Cryst. Growth 272 (2004) p. 211.
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Bakkers, E.P.A.M., Borgström, M.T. & Verheijen, M.A. Epitaxial Growth of III-V Nanowires on Group IV Substrates. MRS Bulletin 32, 117–122 (2007). https://doi.org/10.1557/mrs2007.43
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DOI: https://doi.org/10.1557/mrs2007.43