Abstract
Resistive memory devices based on organic materials that can be configured to two or more stable resistance states have been extensively explored as information storage media due to their advantages, which include simple device structures, low fabrication costs, and flexibility. Various organic-based materials such as small molecules, polymers, and composite materials have been observed to show bistability. This review provides a general summary about the materials, structures, characteristics, and mechanisms of organic resistive memory devices. Several critical strategies for device fabrication, performance enhancement, and integrated circuit architectures are also discussed.
Similar content being viewed by others
References
Y. Yang, J. Ouyang, L. Ma, R.J.H. Tseng, C.W. Chu, Adv. Funct. Mat. 16, 1001 (2006).
J.C. Scott, L.D. Bozano, Adv. Mater. 19, 1452 (2007).
Q.-D. Ling, D.-J. Liaw, C. Zhu, D. S.-H. Chan, E.-T. Kang, K.-G. Neoh, Prog. Polym. Sci. 33, 917 (2008).
J. Ouyang, C.-W. Chu, C.R. Szmanda, L. Ma, Y. Yang, Nat. Mater. 3, 918 (2004).
B. Mukherjee, A.J. Pal, Org. Electron. 7, 249 (2006).
J. Lin, D. Ma, Org. Electron. 10, 275 (2009).
C.W. Chu, J. Ouyang, J.H. Tseng, Y. Yang, Adv. Mater. 17, 1440 (2005).
P.Y. Lai, J.S. Chen, Appl. Phys. Lett. 93, 153305 (2008).
B.-O. Cho, T. Yasue, H. Yoon, M.-S. Lee, I.-S. Yeo, U.I. Chung, J.-T. Moon, B.-I. Ryu, IEEE Int. Electron Devices Meeting (2006); doi:10.1109/IEDM.2006.346729.
G. Liu, Q.-D. Ling, E.-T. Kang, K.-G. Neoh, D.-J. Liaw, F.-C. Chang, C.-X. Zhu, D.S.-H. Chan, J. Appl. Phys. 102, 024502 (2007).
G. Liu, Q.-D. Ling, E.Y.H. Teo, C.-X. Zhu, D.S.-H. Chan, K.-G. Neoh, E.-T. Kang, ACS Nano 3, 1929 (2009).
L.D. Bozano, B.W. Kean, M. Beinhoff, K.R. Carter, P.M. Rice, J.C. Scott, Adv. Funct. Mat. 15, 1933 (2005).
T.-W. Kim, S.-H. Oh, H. Choi, G. Wang, H. Hwang, D.-Y. Kim, T. Lee, Appl. Phys. Lett. 92, 253308 (2008).
H.-T. Lin, Z. Pei, Y.-J. Chan, IEEE Electron Device Lett. 28, 569 (2007).
J.-R. Chen, H.-T. Lin, G.-W. Hwang, Y.-J. Chan, P.-W. Li, Nanotechnology 20, 255706 (2009).
K. Asadi, D.M. de Leeuw, B. de Boer, P.W.M. Blom, Nat. Mater. 7, 547 (2008).
Z.J. Donhauser, B.A. Mantooth, K.F. Kelly, L.A. Bumm, J.D. Monnell, J.J. Stapleton, D.W. Price, A.M. Rawlett, D.L. Allara, J.M. Tour, P.S. Weiss, Science 292, 2303 (2001).
G. Peng, D. Yuan-Wei, J. Xin, L. Yin-Xiang, X. Wei, IEEE Electron Device Lett. 28, 572 (2007).
C.N. Lau, D.R. Stewart, R.S. Williams, M. Bockrath, Nano Lett. 4, 569 (2004).
B.C. Das, A.J. Pal, Org. Electron. 9, 39 (2008).
H. Carchano, R. Lacoste, Y. Segui, Appl. Phys. Lett. 19, 414 (1971).
H.K. Henisch, W.R. Smith, Appl. Phys. Lett. 24, 589 (1974).
S.L. Lim, Q. Ling, E.Y.H. Teo, C.X. Zhu, D.S.H. Chan, E.T. Kang, K.G. Neoh, Chem. Mater. 19, 5148 (2007).
T.-W. Kim, S.-H. Oh, H. Choi, G. Wang, H. Hwang, D.-Y. Kim, T. Lee, IEEE Electron Device Lett. 29, 852 (2008).
H.S. Majumdar, A. Bandyopadhyay, A. Bolognesi, A.J. Pal, J. Appl. Phys. 91, 2433 (2002).
Y. Sadaoka, Y. Sakai, J. Chem. Soc., Faraday Trans. 2 72, 1911 (1976).
S.H. Kim, K.S. Yook, J. Jang, J.Y. Lee, Synth. Met. 158, 861 (2008).
A. Laiho, H.S. Majumdar, J.K. Baral, F. Jansson, R. Osterbacka, O. Ikkala, Appl. Phys. Lett. 93, 203309 (2008).
F. Li, T.W. Kim, W. Dong, Y.-H. Kim, Appl. Phys. Lett. 92, 011906 (2008).
F. Li, D.-I. Son, S.-M. Seo, H.-M. Cha, H.-J. Kim, B.-J. Kim, J.H. Jung, T.W. Kim, Appl. Phys. Lett. 91, 122111 (2007).
D.T. Simon, M.S. Griffo, R.A. DiPietro, S.A. Swanson, S.A. Carter, Appl. Phys. Lett. 89, 133510 (2006).
F. Verbakel, S.C.J. Meskers, R.A.J. Janssen, Chem. Mater. 18, 2707 (2006).
Y. Song, Q.D. Ling, S.L. Lim, E.Y.H. Teo, Y.P. Tan, L. Li, E.T. Kang, D.S.H. Chan, C. Zhu, IEEE Electron Device Lett. 28, 107 (2007).
S. Paul, A. Kanwal, M. Chhowalla, Nanotechnology 17, 145 (2006).
D.-I. Son, J.-H. Kim, D.-H. Park, W.K. Choi, F. Li, J.H. Ham, T.W. Kim, Nanotechnology 19, 055204 (2008).
A. Bandyopadhyay, A.J. Pal, Appl. Phys. Lett. 84, 999 (2004).
B. Cho, T.-W. Kim, M. Choe, G. Wang, S. Song, T. Lee, Org. Electron. 10, 473 (2009).
B. Cho, T.-W. Kim, S. Song, Y. Ji, M. Jo, H. Hwang, G.-Y. Jung, T. Lee, Adv. Mater. 22, 1228 (2010).
M.J. Lee, Y. Park, D.S. Suh, E.H. Lee, S. Seo, D.C. Kim, R. Jung, B.S. Kang, S.E. Ahn, C.B. Lee, D.H. Seo, Y.K. Cha, I.K. Yoo, J.S. Kim, B.H. Park, Adv. Mater. 19, 3919 (2007).
H.-T. Lin, Z. Pei, J.-R. Chen, Y.-J. Chan, IEEE Electron Device Lett. 30, 18 (2009).
I.G. Baek, D.C. Kim, M.J. Lee, H.J. Kim, E.K. Yim, M.S. Lee, J.E. Lee, S.E. Ahn, S. Seo, J.H. Lee, J.C. Park, Y.K. Cha, S.O. Park, H.S. Kim, I.K. Yoo, U.I. Chung, J.T. Moon, B.I. Ryu, IEEE Int. Electron Devices Meeting (2005), doi:10.1109/ IEDM.2005.1609462.
H.S. Nalwa, Ferroelectric Polymers: Chemistry, Physics, and Applications (Marcel Dekker, New York, 1995).
G. Dearnaley, D.V. Morgan, A.M. Stoneham, J. Non-Cryst. Solids 4, 593 (1970).
G. Dearnaley, A.M. Stoneham, D.V. Morgan, Rep. Prog. Phys. 33, 1129 (1970).
L.F. Pender, R.J. Fleming, J. Appl. Phys. 46, 3426 (1975).
Y. Segui, B. Ai, H. Carchano, J. Appl. Phys. 47, 140 (1976).
W. Hwang, K.C. Kao, J. Chem. Phys. 60, 3845 (1974).
W.-J. Joo, T.-L. Choi, K.-H. Lee, Y. Chung, J. Phys. Chem. B 111, 7756 (2007).
S. Sivaramakrishnan, P.-J. Chia, Y.-C. Yeo, L.-L. Chua, P.K.H. Ho, Nat. Mater. 6, 149 (2007).
A. Carbone, B.K. Kotowska, D. Kotowski, Phys. Rev. Lett. 95, 236601 (2005).
P. Mark, W. Helfrich, J. Appl. Phys. 33, 205 (1962).
S. Das, A.J. Pal, Appl. Phys. Lett. 76, 1770 (2000).
J.G. Simmons, R.R. Verderber, Proc. R. Soc. London, Ser. A 301, 77 (1967).
V.S. Reddy, S. Karak, A. Dhar, Appl. Phys. Lett. 94, 173304 (2009).
J.-G. Park, W.-S. Nam, S.-H. Seo, Y.-G. Kim, Y.-H. Oh, G.-S. Lee, U.-G. Paik, Nano Lett. 9, 1713 (2009).
R.S. Potember, T.O. Poehler, D.O. Cowan, Appl. Phys. Lett. 34, 405 (1979).
E.I. Kamitsos, C.H. Tzinis, W.M. Risen, Solid State Commun. 42, 561 (1982).
A.J. Kronemeijer, H.B. Akkerman, T. Kudernac, B.J.V. Wees, B.L. Feringa, P.W.M. Blom, B.D. Boer, Adv. Mater. 20, 1467 (2008).
E.Y.H. Teo, Q.D. Ling, Y. Song, Y.P. Tan, W. Wang, E.T. Kang, D.S.H. Chan, C. Zhu, Org. Electron. 7, 173 (2006).
J.H.A. Smits, S.C.J. Meskers, R.A.J. Janssen, A.W. Marsman, D.M. de Leeuw, Adv. Mater. 17, 1169 (2005).
T.-W. Kim, K. Lee, S.-H. Oh, G. Wang, D.-Y. Kim, G.-Y. Jung, T. Lee, Nanotechnology 19, 405201 (2008).
T.-W. Kim, H. Choi, S.-H. Oh, M. Jo, G. Wang, B. Cho, D.-Y. Kim, H. Hwang, T. Lee, Nanotechnology 20, 025201 (2009).
T.-W. Kim, H. Choi, S.-H. Oh, G. Wang, D.-Y. Kim, H. Hwang, T. Lee, Adv. Mater. 21, 2497 (2009).
K. Kinoshita, K. Tsunoda, Y. Sato, H. Noshiro, S. Yagaki, M. Aoki, Y. Sugiyama, Appl. Phys. Lett. 93, 033506 (2008).
J.C. Scott, Science 304, 62 (2004).
International Technology Roadmap For Semiconductors (2007). Emerging research devices. (Semiconductor Industry Association, International Sematech, Austin, TX 2007).
S. Möller, C. Perlov, W. Jackson, C. Taussig, S.R. Forrest, Nature 426, 166 (2003).
E.Y.H. Teo, C. Zhang, S.L. Lim, E.-T. Kang, D.S.H. Chan, C. Zhu, IEEE Electron Device Lett. 30, 487 (2009).
S.-E. Ahn, B.S. Kang, K.H. Kim, M.-J. Lee, C.B. Lee, S.G., C.J. Kim, Y. Park, IEEE Electron Device Lett. 30, 550 (2009).
M.-J. Lee, S.I. Kim, C.B. Lee, H. Yin, S.-E. Ahn, B.S. Kang, K.H. Kim, J.C. Park, C.J. Kim, I. Song, S.W. Kim, G. Stefanovich, J.H. Lee, S.J. Chung, Y.H. Kim, Y. Park, Adv. Funct. Mater. 19, 1587 (2009).
K. Asadi, M. Li, N. Stingelin, P.W.M. Blom, D.M. de Leeuw, Appl. Phys. Lett. 97, 193308 (2010).
H.Y. Jeong, Y.I. Kim, J.Y. Lee, S.-Y. Choi, Nanotechnology 21, 115203 (2010).
S. Song, B. Cho, T.-W. Kim, Y. Ji, M. Jo, G. Wang, M. Choe, Y.H. Kahng, H. Hwang, T. Lee, Adv. Mater. 22, 5048 (2010).
W.L. Kwan, R.J. Tseng, W. Wu, Q. Pei, Y. Yang, IEEE Int. Electron Devices Meeting (2007); doi:10.1109/IEDM.2007.4418911.
W.L. Kwan, R.J. Tseng, Y. Yang, Philos. Trans. R. Soc., A 367, 4159 (2009).
C. Kügeler, M. Meier, R. Rosezin, S. Gilles, R. Waser, Solid-State Electron. 53, 1287 (2009).
J.J. Kim, B. Cho, K.S. Kim, T. Lee, G.Y. Jung, Adv. Mater. 23, 2104 (2011).
L. Li, Q.-D. Ling, S.-L. Lim, Y.-P. Tan, C. Zhu, D.S.H. Chan, E.-T. Kang, K.-G. Neoh, Org. Electron. 8, 401 (2007).
S. Kim, Y.-K. Choi, Appl. Phys. Lett. 92, 223508 (2008).
S. Lee, H. Kim, D.-J. Yun, S.-W. Rhee, K. Yong, Appl. Phys. Lett. 95, 262113 (2009).
H.Y. Jeong, J.Y. Kim, J.W. Kim, J.O. Hwang, J.-E. Kim, J.Y. Lee, T.H. Yoon, B.J. Cho, S.O. Kim, R.S. Ruoff, S.-Y. Choi, Nano Lett. 10, 4381 (2010).
Y. Ji, B. Cho, S. Song, T.-W. Kim, M. Choe, Y.H. Kahng, T. Lee, Adv. Mater. 22, 3071 (2010).
T. Sekitani, T. Yokota, U. Zschieschang, H. Klauk, S. Bauer, K. Takeuchi, M. Takamiya, T. Sakurai, T. Someya, Science 326, 1516 (2009).
Y. Ji, S. Lee, B. Cho, S. Song, T. Lee, ACS Nano 5, 5995 (2011).
K. Lian, R. Li, H. Wang, J. Zhang, D. Gamota, Mater. Sci. Eng., B 167, 12 (2010).
A.J. Heeger, Angew. Chem. Int. Ed. 40, 2591 (2001).
A.G. MacDiarmid, Angew. Chem. Int. Ed. 40, 2581 (2001).
R. Waser, M. Aono, Nat. Mater. 6, 833 (2007).
Q.D. Ling, S.L. Lim, Y. Song, C.X. Zhu, D.S.H. Chan, E.T. Kang, K.G. Neoh, Langmuir 23, 312 (2007).
L.-H. Xie, Q.-D. Ling, X.-Y. Hou, W. Huang, J. Am. Chem. Soc. 130, 2120 (2008).
Acknowledgments
The authors thank T.L.’s group members, including Byungjin Cho, Sunghoon Song, and Yongsung Ji, who are working on this topic. T.L. also acknowledges partial support from the Korean National Research Laboratory program and National Core Research Center grant from the Korean Ministry of Education, Science, and Technology. Y.C. acknowledges the support of the Defense Advanced Research Projects Agency (DARPA) under the program “Physical Intelligence,” and by the Air Force Office of Scientific Research (AFOSR) under the program “Bio-inspired intelligent sensing materials for Fly-by-Feel autonomous vehicle.”
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Lee, T., Chen, Y. Organic resistive nonvolatile memory materials. MRS Bulletin 37, 144–149 (2012). https://doi.org/10.1557/mrs.2012.4
Published:
Issue Date:
DOI: https://doi.org/10.1557/mrs.2012.4