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Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD

  • Progress and future directions for atomic layer deposition and ALD-based chemistry
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Abstract

As applications of atomic layer deposition (ALD) in emerging areas such as nanoelectronics, photovoltaics, and flexible electronics expand beyond single-wafer semiconductor processing, there is a growing need for novel approaches to integrate new process designs, substrate materials, and substrate delivery methods. An overview is given of new means to extend the capabilities of ALD and to improve the speed and simplicity of ALD coatings using new reactor designs. These include energy-enhanced and spatial ALD schemes involving plasma, direct-write, atmospheric pressure, and roll-to-roll processing. The long-term goal of this work is to integrate viable high-throughput capabilities with ALD processes.

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References

  1. T. Suntola, AVS Topical Conference on Atomic Layer Deposition (ALD2004); University of Helsinki, Helsinki, Finland, 16 August 2004.

  2. M. Ritala, J. Niinistö, ECS Trans. 25, 641 (2009).

    Google Scholar 

  3. A. Paranjpe, S. Gopinath, T. Omstead, R. Bubber, J. Electrochem. Soc. 148, G465 (2001).

  4. S.K. Kim, G.-J. Choi, S.Y. Lee, M. Seo, S.W. Lee, J.H. Han, H.-S. Ahn, S. Han, C.S. Hwang, Adv. Mater. 20, 1429 (2008).

  5. D. James, in Proc. IEEE/SEMI—Advanced Semiconductor Manufacturing Conference (2008), pp. 76.

  6. E. Granneman, P. Fischer, D. Pierreux, H. Terhorst, P. Zagwijn, Surf. Coat. Technol. 201, 8899 (2007).

  7. M. Putkonen, ECS Trans. 25, 143 (2009).

  8. S.B.S. Heil, J.L. van Hemmen, C.J. Hodson, N. Singh, J.H. Klootwijk, F. Roozeboom, M.C.M. van de Sanden, W.M.M. Kessels, J. Vac. Sci. Technol., A 25, 1357 (2007).

  9. H.B. Profijt, S.E. Potts, M.C.M. van de Sanden, W.M.M. Kessels, J. Vac. Sci. Technol A. 29, 050801 (2011).

  10. S.E. Potts, W. Keuning, E. Langereis, G. Dingemans, M.C.M. van de Sanden, W.M.M. Kessels, J. Electrochem. Soc. 157, P66 (2010).

  11. H.B. Profijt, P. Kudlacek, M.C.M. van de Sanden, W.M.M. Kessels, J. Electrochem. Soc. 158, G88 (2011).

  12. H.C.M. Knoops, E. Langereis, M.C.M. van de Sanden, W.M.M. Kessels, J. Electrochem. Soc. 157, G241 (2010).

  13. J. Niinistö, M. Kariniemi, M. Putkonen, M. Vehkamäki, M. Kemell, M. Ritala, M. Leskelä, AVS Topical Conference on Atomic Layer Deposition (ALD2011), Cambridge, MA, 27 June 2011.

  14. E. Langereis, M. Creatore, S.B.S. Heil, M.C.M. van de Sanden, W.M.M. Kessels, Appl. Phys. Lett. 89, 081915 (2006).

  15. J. Beynet, P. Wong, A. Miller, S. Locorotondo, D. Vangoidsenhoven, T.H. Yoon, M. Demand, H.S. Park, T. Vandeweyer, H. Sprey, Y.M. Yoo, M. Maenhoudt, Proc. SPIE 7520, 75201J (2009).

  16. M.J. Biercuk, D.J. Monsma, C.M. Marcus, J.S. Becker, R.G. Gordon, Appl. Phys. Lett. 83, 2405 (2003).

  17. R. Chen, H. Kim, P.C. McIntyre, D.W. Porter, S.F. Bent, Appl. Phys. Lett. 86, 191910 (2005).

  18. T. Aaltonen, P. Alén, M. Ritala, M. Leskelä, Chem. Vap. Depostion 9, 45 (2003).

  19. H.C.M. Knoops, A.J.M. Mackus, M.E. Donders, P.H.L. Notten, M.C.M. van de Sanden, W.M.M. Kessels, Electrochem. Solid-State Lett. 12, G34 (2009).

  20. A.J.M. Mackus, J.J.L. Mulders, M.C.M. van de Sanden, W.M.M. Kessels, J. Appl. Phys. 107, 116102 (2010).

  21. A.J.M. Mackus, J.J.L. Mulders, P.H.F. Trompenaars, S.A.F. Dielissen, M.J. Weber, W.M.M. Kessels, AVS Topical Conference on Atomic Layer Deposition (ALD2011); Cambridge, MA, 29 June, 2011.

  22. A.J.M. Mackus, J.J.L. Mulders, W.M.M. Kessels, Microsc. Microanal. 25, 5 (2011).

  23. T. Suntola, U.S. patent 4058430 (1977).

  24. D.H. Levy, D. Freeman, S.F. Nelson, P.J. Cowdery-Corvan, L.M. Irving, Appl. Phys. Lett. 92, 192101 (2008).

  25. D.H. Levy, S.F. Nelson, D. Freeman, J. Display Technol. 5, 484 (2009).

  26. MRS Bull. 36 (11) (2011).

  27. S.K. Chunduri, Photon International 146 (March 2011).

  28. www.beneq.com (accessed June 18, 2011).

  29. E.H.A. Granneman, P. Vermont, V. Kuznetsov, M. Coolen, K. Vanormelingen, Proc. 25th European Photovoltaic Solar Energy Conference and Exhibition, Valencia, Spain (2010), pp. 1640.

  30. www.levitech.nl (accessed June 18, 2011).

  31. P. Poodt, A. Lankhorst, F. Roozeboom, K. Spee, D. Maas, A. Vermeer, Adv. Mater. 22, 3564 (2010).

  32. www.solaytec.org (accessed June 18, 2011).

  33. B. Hoex, S.B.S. Heil, E. Langereis, M.C.M. van de Sanden, W.M.M. Kessels, Appl. Phys. Lett. 89, 042112 (2006).

  34. G. Dingemans, M.C.M. van de Sanden, W.M.M. Kessels, Electrochem. Solid- State Lett. 13, H76 (2010).

  35. P. Poodt, B. Kniknie, A. Branca, H. Winands, F. Roozeboom, Phys. Status Solidi RRL 5, 165 (2011).

  36. H.W. de Vries, M.C.M. van de Sanden, M. Creatore, W.M.M. Kessels, U.S. patent application 0324971 (2009).

  37. E. Dickey, W. Barrow, in 52nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, Santa Clara, CA (2009), p. 720.

  38. P.S. Maydannik, T.O. Kääriäinen, D.C. Cameron, in 53rd Annual Technical Conference Proceedings of Society of Vacuum Coaters, Orlando, FL (2010), p. 138.

  39. K. Lahtinen, P. Maydannik, P. Johansson, T. Kääriäinen, D.C. Cameron, J. Kuusipalo, Surf. Coat. Technol. 205, 3916 (2011).

    Google Scholar 

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Authors and Affiliations

  1. Eindhoven University of Technology, The Netherlands

    W. M. M. (Erwin) Kessels

  2. Beneq Oy, Finland

    Matti Putkonen

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  1. W. M. M. (Erwin) Kessels
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  2. Matti Putkonen
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Correspondence to W. M. M. (Erwin) Kessels.

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(Erwin) Kessels, W.M.M., Putkonen, M. Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD. MRS Bulletin 36, 907–913 (2011). https://doi.org/10.1557/mrs.2011.239

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  • DOI: https://doi.org/10.1557/mrs.2011.239

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