Abstract
A facile solution-based processing route using standard spin-coating deposition techniques has been developed for the production of reliable capacitors based on lead lanthanum zirconate titanate (PLZT) with active areas of ⩾1 mm2 and dielectric layer thicknesses down to 50 nm. With careful control of the dielectric phase development through improved processing, ultrathin capacitors exhibited slim ferroelectric hysteresis loops and dielectric constants of >1000, similar to those of much thicker films. Thus, it has been demonstrated that chemical solution deposition is a viable route to the production of capacitor films which are as thin as 50 nm but are still macroscopically addressable with specific capacitance values >160 nF/mm2.
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Acknowledgments
B.B. McKenzie provided essential technical assistance in the microstructural characterization of these films. The authors would also like to thank P.A. Mahoney and J.S. Wheeler for their technical assistance and valuable input into this project. Sandia is a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company, for the United States Department of Energy under contract DE-AC04-94AL85000.
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Brennecka, G.L., Tuttle, B.A. Fabrication of ultrathin film capacitors by chemical solution deposition. Journal of Materials Research 22, 2868–2874 (2007). https://doi.org/10.1557/JMR.2007.0371
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DOI: https://doi.org/10.1557/JMR.2007.0371