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Effect of GeO2 additive on fluorescence intensity enhancement in bismuth-doped silica glass

Published online by Cambridge University Press:  03 March 2011

Yasushi Fujimoto*
Affiliation:
Institute of Laser Engineering, Osaka University, Suita, Osaka 565-0871, Japan
Yuki Hirata
Affiliation:
Kinki University, School of Science and Engineering, Department of Electric and Electronic Engineering, Higashi-Osaka 577-8502, Japan
Yoshiyuki Kuwada
Affiliation:
Institute of Laser Engineering, Osaka University, Suita, Osaka 565-0871, Japan
Takahiro Sato
Affiliation:
Institute of Laser Engineering, Osaka University, Suita, Osaka 565-0871, Japan
Masahiro Nakatsuka
Affiliation:
Institute of Laser Engineering, Osaka University, Suita, Osaka 565-0871, Japan
*
a) Address all correspondence to this author. e-mail: fujimoto@ile.osaka-u.ac.jp
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Abstract

We observed the enhancement of fluorescence intensity due to the addition of GeO2 in bismuth-doped silica glass (BiSG), which has a peculiar fluorescence at 1.25 μm with a full width at half-maximum of 300 nm. Experimental results revealed that the fluorescence intensity from BiSG with 5.0 mol% GeO2 increased remarkably to be 26.3 times greater than that without GeO2 additive for the same Bi2O3 concentration (0.1 mol%). Furthermore, the enhanced sample showed almost the same intensity as BiSG without GeO2 for 1.0 mol% Bi2O3. These results demonstrate that GeO2 additive effectively promotes the generation of peculiar luminescent centers.

Type
Rapid Communications
Copyright
Copyright © Materials Research Society 2007

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References

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