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High-rate sputtering deposition of high- and low-refractive index films from conductive composites

Published online by Cambridge University Press:  21 May 2015

Li Qin Zhou ,
Qi Hua Fan ,
Raul Simões  and
Victor Neto
Li Qin Zhou
Affiliation:
Department of Mechanical Engineering, Centre for Mechanical Technology and Automation, University of Aveiro, 3810-193 Aveiro, Portugal; Aveiro Nanotechnology Institute, University of Aveiro, 3810-193 Aveiro, Portugal
Qi Hua Fan*
Affiliation:
Department of Electrical Engineering and Computer Science, South Dakota State University, Brookings, South Dakota
Raul Simões
Affiliation:
Department of Mechanical Engineering, Centre for Mechanical Technology and Automation, University of Aveiro, 3810-193 Aveiro, Portugal; Aveiro Nanotechnology Institute, University of Aveiro, 3810-193 Aveiro, Portugal
Victor Neto*
Affiliation:
Department of Mechanical Engineering, Centre for Mechanical Technology and Automation, University of Aveiro, 3810-193 Aveiro, Portugal; Aveiro Nanotechnology Institute, University of Aveiro, 3810-193 Aveiro, Portugal
*
Address all correspondence to Qi Hua Fan, Victor Neto atqihua.fan@sdstate.edu; vneto@ua.pt
Address all correspondence to Qi Hua Fan, Victor Neto atqihua.fan@sdstate.edu; vneto@ua.pt
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Abstract

Dielectric thin films of high- and low-refractive index are the essential components for optical coatings. To achieve high sputtering rates and superior film quality, the authors have developed novel conductive SiO2:Si and ZnO:Zn composites that become conductive once the doped silicon and metal Zn reach a critical ratio. The sputtering characteristics of the composite targets in direct current and radio-frequency (RF) plasma discharge are quite different from the corresponding element targets. The optical properties of the RF sputtered SiO2 and ZnO films from the composite targets is comparable with the films obtained from RF sputtering of pure oxide targets.

Type
Research Letters
Information
MRS Communications , Volume 5 , Issue 2 , June 2015 , pp. 327 - 332
Copyright
Copyright © Materials Research Society 2015 

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