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Effect of film thickness on the stretchability and fatigue resistance of Cu films on polymer substrates

Published online by Cambridge University Press:  25 November 2014

Byoung-Joon Kim ,
Hae-A-Seul Shin ,
Ji-Hoon Lee ,
Tae-Youl Yang ,
Thomas Haas ,
Patric Gruber ,
In-Suk Choi ,
Oliver Kraft  and
Young-Chang Joo
Byoung-Joon Kim
Affiliation:
Surface Technology Division, Korea Institute of Materials Science (KIMS), Changwon 641-831, Republic of Korea
Hae-A-Seul Shin
Affiliation:
Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea
Ji-Hoon Lee
Affiliation:
Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea
Tae-Youl Yang
Affiliation:
Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea
Thomas Haas
Affiliation:
Institute for Applied Materials, Karlsruhe Institute of Technology, Karlsruhe 76021, Germany
Patric Gruber
Affiliation:
Institute for Applied Materials, Karlsruhe Institute of Technology, Karlsruhe 76021, Germany
In-Suk Choi
Affiliation:
High Temperature Energy Materials Research Center, Korea Institute of Science and Technology, Seoul 136-791, Korea
Oliver Kraft*
Affiliation:
Institute for Applied Materials, Karlsruhe Institute of Technology, Karlsruhe 76021, Germany
Young-Chang Joo*
Affiliation:
Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea
*
a)Address all correspondence to these authors. e-mail: oliver.kraft@kit.edu
b)e-mail: ycjoo@snu.ac.kr
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Abstract

The thickness dependence of the electrical stability under monotonic and cyclic tensile loading is investigated for Cu films on polymer substrates. As for monotonic tensile deformation, thicker films show better stability than thinner films due to their higher ductility and the larger capability of strain accommodation. For the fatigue resistance, however, a more complex behavior was observed depending on the amount of the applied strain. For low strain amplitude in the high cycle fatigue (HCF) regime, thinner films exhibit longer fatigue life because the larger strength of thinner films suppresses dislocation movement and damage nucleation. However, for high strain amplitudes in the low cycle fatigue (LCF) regime, the fatigue life for thinner films is drastically reduced compared to thicker films. It is shown that fatigue coefficients in the LCF regime can be obtained when applying the Coffin–Manson relationship.

Keywords

fatiguefracturefilm
Type
Articles
Information
Journal of Materials Research , Volume 29 , Issue 23 , 14 December 2014 , pp. 2827 - 2834
Copyright
Copyright © Materials Research Society 2014 

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References

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