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Table of Contents - Volume 98 - 1987 MRS Spring Meeting - Symposium K – Plasma Processing and Synthesis of Materials II

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Articles

The Mathematical Modelling of Transport Phenomena in Non-Transferred Plasma Systems: Accomplishments and Unresolved Problems The Mathematical Modelling of Transport Phenomena in Non-Transferred Plasma Systems: Accomplishments and Unresolved Problems

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A. H. Dilawari and J. Szekely

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-3 (About DOI)

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Theoretical Prediction of the Effect of Coil Configuration on Gas Mixing in an Inductively Coupled Plasma Torch Theoretical Prediction of the Effect of Coil Configuration on Gas Mixing in an Inductively Coupled Plasma Torch

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John W. Mckelliget and Nagy El-Kaddah

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-21 (About DOI)

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A Kinetic Model for Low-Pressure RF Discharge Etching of Silicon Using SF₆ A Kinetic Model for Low-Pressure RF Discharge Etching of Silicon Using SF₆

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Arit P. Paranjpe, George Kychakoff and Sidney A. Self

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-29 (About DOI)

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Estimation of Ion Impact Energies and Electrode Self-Bias Voltage in Capacitive RF Discharges Estimation of Ion Impact Energies and Electrode Self-Bias Voltage in Capacitive RF Discharges

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S. E. Savas

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-35 (About DOI)

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A Critical Analysis of Proposed Plasma Jet Models to Predict Temperature and Velocity Profiles A Critical Analysis of Proposed Plasma Jet Models to Predict Temperature and Velocity Profiles

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Daniel Y.C. Wei, Bakhtier Farouk and Diran Apelian

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-41 (About DOI)

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Modeling Turbulence in a Thermal Plasma Reactor Modeling Turbulence in a Thermal Plasma Reactor

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D. J. Varacalle, L. E. Reynolds and C. B. Shaw

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-49 (About DOI)

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A Method for Non-Intrusively Determining ion Impact Current Density and Energy Distribution in Capacitively Coupled RF Plasmas A Method for Non-Intrusively Determining ion Impact Current Density and Energy Distribution in Capacitively Coupled RF Plasmas

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S. E. Savas

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-61 (About DOI)

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A Mathematical Representation of the ion Nitriding Process A Mathematical Representation of the ion Nitriding Process

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J -L. Marchand, D. Ablitzer, J. Szekely, H. Michel and M. Gantois

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-67 (About DOI)

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Effect of Particle Loading on DC Plasma Jet Profile During Low Pressure Plasma Deposition Effect of Particle Loading on DC Plasma Jet Profile During Low Pressure Plasma Deposition

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Daniel Y.C. Wei, Diran Apelian and Bakhtier Farouk

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-77 (About DOI)

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Melting Phenomena of Several Nickel Base Alloys in a Plasma Jet Operating at Low Pressure Melting Phenomena of Several Nickel Base Alloys in a Plasma Jet Operating at Low Pressure

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Ronald W. Smith and Diran Apelian

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-89 (About DOI)

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Temperature Measurements in Atmospheric Spraying Plasmas Jets : Gas and Particles in Flight Temperature Measurements in Atmospheric Spraying Plasmas Jets : Gas and Particles in Flight

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P. Fauchais, J. F. Coudert, M. Vardelle and A. Vardelle

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-101 (About DOI)

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A Spectroscopic Study of the Conditions Required for Plasma Etching of Aluminium in BCl₃ and Cl₂ Plasmas A Spectroscopic Study of the Conditions Required for Plasma Etching of Aluminium in BCl₃ and Cl₂ Plasmas

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J. A. Cairns, R. Smailes, D. C. W. Blaikley, P. M. Banks, G. Hancock, I. Hussla and W. Katzschner

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-121 (About DOI)

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Simultaneous Measurement of Particle Size and Temperature in a Plasma Torch Simultaneous Measurement of Particle Size and Temperature in a Plasma Torch

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J. R. Fincke, C. L. Jeffery and S. B. Englert

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-127 (About DOI)

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Laser Induced Fluorescence and Optical Emission Studies of Fluorocarbon Plasmas Laser Induced Fluorescence and Optical Emission Studies of Fluorocarbon Plasmas

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J. P. Booth, C. Hancock, N. D. Perry, D. C. W. Blaikleye, J. A. Cairns and R. Smailes

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-135 (About DOI)

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The Potential of Infrared Video Thermography for Control of Arc-Plasma Spray Fabrications The Potential of Infrared Video Thermography for Control of Arc-Plasma Spray Fabrications

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D. Harris and M. Kelly

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-141 (About DOI)

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The Application of Planar Laser-Induced Fluorescence as a Diagnostic in Plasma Processing The Application of Planar Laser-Induced Fluorescence as a Diagnostic in Plasma Processing

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J. K. Partin, J. R. Fincke, C. L. Jeffery, S. C. Snyder and J. A. Batdorf

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-149 (About DOI)

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Characterization of Plasma-Deposited Amorphous Carbon Films Characterization of Plasma-Deposited Amorphous Carbon Films

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Wen. L. Hsu, G. W. Foltz, F. A. Greulich, K. F. Mccarty, G. J. Thomas, P. F. Green and B. L. Doyle

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-155 (About DOI)

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Laser/Optical Diagnostic Techniques for Plasma Materials Processing Laser/Optical Diagnostic Techniques for Plasma Materials Processing

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Ward C. Roman

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-161 (About DOI)

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An Experimental Method for Species Concentration Measurements in a Welding ARC Using Laser-Induced Fluorescence An Experimental Method for Species Concentration Measurements in a Welding ARC Using Laser-Induced Fluorescence

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S. C. Snyder, C. B. Shaw and C. L. Shull

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-177 (About DOI)

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Diagnostic Techniques for Thermal Plasmas Diagnostic Techniques for Thermal Plasmas

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Sidney A. Self

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-183 (About DOI)

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Plasma Diagnostics for a Low-Pressure Plasma Spray Deposition System Plasma Diagnostics for a Low-Pressure Plasma Spray Deposition System

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Suzanne H. Weissman, Mark F. Smith and William B. Chambers

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-197 (About DOI)

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In-Situ Monitoring of Electrical Parameters for Dry Etching In-Situ Monitoring of Electrical Parameters for Dry Etching

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J. Ignacio Ulacia F and James P. McVittie

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-203 (About DOI)

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Spatially-Resolved Emission Profiles of Parallel Plate RF Glow Discharges Spatially-Resolved Emission Profiles of Parallel Plate RF Glow Discharges

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Richard M. Roth

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-209 (About DOI)

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Plasma Chemical Aspects of Magnetron Ion Etching with CF₄/O₂ and CF₄/H₂ Plasma Chemical Aspects of Magnetron Ion Etching with CF₄/O₂ and CF₄/H₂

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A. A. Bright, S. Kaushik and G. S. Oehrlein

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-217 (About DOI)

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Large Area Electron Beam Enhanced Reactive Etching of SiO₂ Large Area Electron Beam Enhanced Reactive Etching of SiO₂

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P. Kirk Boyer, Tim Verhey and Jorge J. Rocca

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-223 (About DOI)

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Mechanism of the Slow-Down of the Silicon Etch Rate by a Fluorocarbon Overlayer in CF₄/H₂ Reactive Ion Etching of Silicon Mechanism of the Slow-Down of the Silicon Etch Rate by a Fluorocarbon Overlayer in CF₄/H₂ Reactive Ion Etching of Silicon

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Gottlieb S. Oehrlein, Steve W. Robey and Mark A. Jaso

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-229 (About DOI)

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Growth and Characterization of Epitaxial GaAs Deposited by Plasma-Enhanced Metal-Organic Chemical Vapor Deposition Growth and Characterization of Epitaxial GaAs Deposited by Plasma-Enhanced Metal-Organic Chemical Vapor Deposition

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A. D. Huelsman, E. Yoon and R. Reif

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-235 (About DOI)

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A Study of Titanium Silicide Polycide Etching A Study of Titanium Silicide Polycide Etching

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S. M. Bobbio, Y. S. Ho and T. Lopez

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-243 (About DOI)

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Pulsed Inductive Plasma Processing for Amorphous Thin Film Formation Pulsed Inductive Plasma Processing for Amorphous Thin Film Formation

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Kenji Ebihara and Sadao Maeda

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-249 (About DOI)

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A New Method for Real-Time Plasma Etch Process Control: Correlation of Contact Resistance with Nondestructive Modulated Reflectance A New Method for Real-Time Plasma Etch Process Control: Correlation of Contact Resistance with Nondestructive Modulated Reflectance

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Alp Malazgirt and W. Lee Smith

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-255 (About DOI)

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Photoresist Stripping Using a Remote Plasma: Chemical and Transport Effects Photoresist Stripping Using a Remote Plasma: Chemical and Transport Effects

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Lee M. Loewenstein, Craig H. Huffman and Cecil J. Davis

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-267 (About DOI)

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The Influence of Magnetic Fields on the Properties of Amorphous Carbon Prepared by Plasma Deposition The Influence of Magnetic Fields on the Properties of Amorphous Carbon Prepared by Plasma Deposition

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R. H. Jarman and A. T. Howe

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-273 (About DOI)

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X-Ray Photoemission Study of Silicon Nitride-GaAs Interfaces in Relation with GaAs Mesfet Passivation X-Ray Photoemission Study of Silicon Nitride-GaAs Interfaces in Relation with GaAs Mesfet Passivation

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Patrick Alnot, J. Olivier, F. Wyczisk, J. F. Peray and R. Joubart

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-279 (About DOI)

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Bonded Hydrogen in Silicon Oxide Thin Films Deposited By Remote Plasma Enhanced Chemical Vapor Deposition Bonded Hydrogen in Silicon Oxide Thin Films Deposited By Remote Plasma Enhanced Chemical Vapor Deposition

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D. V. Tsu and G. Lucovsky

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-285 (About DOI)

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Deposition of A-Ge:H by Gef₄/H ₂ Glow Discharge Deposition of A-Ge:H by Gef₄/H ₂ Glow Discharge

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D. Slobodin, S. Aljishi and S. Wagner

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-291 (About DOI)

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Measurement of Plasma Etch-Induced Damage to Silicon Beneath Si0 ₂ Layer: Effective Range of Plasma Etch Damage Through Si0 ₂ Measurement of Plasma Etch-Induced Damage to Silicon Beneath Si0 ₂ Layer: Effective Range of Plasma Etch Damage Through Si0 ₂

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W. Lee Smith and I-Wen Huang Connick

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-299 (About DOI)

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Gate Oxide Damage in Dry Photoresist Stripping Environments Gate Oxide Damage in Dry Photoresist Stripping Environments

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Karen H. Sibbett, J. Ignacio Ulacia, James P. McVittie and Richard F. Reichelderfer

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-307 (About DOI)

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High Quality Deposition of SiO₂ Downstream from a Microwave Discharge High Quality Deposition of SiO₂ Downstream from a Microwave Discharge

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B. Robinson, P. D. Hoh, P. Madakson, T. N. Nguyen and S. A. Shivashankar

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-313 (About DOI)

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The Effects of Modulation on an RF Discharge in Silane and on the Deposited a-Si:H The Effects of Modulation on an RF Discharge in Silane and on the Deposited a-Si:H

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L. J. Overzet, J. T. Verdeyen, R. M. Roth and F. F. Carasco

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-321 (About DOI)

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The Relationship Between Emission Spectroscopy and Optical Properties of Amorphous Carbon Films The Relationship Between Emission Spectroscopy and Optical Properties of Amorphous Carbon Films

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Richard M. Roth and Richard H. Jarman

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-327 (About DOI)

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Plasma Process Routes to Synthesis of Carbide, Boride and Nitride Ceramic Powders Plasma Process Routes to Synthesis of Carbide, Boride and Nitride Ceramic Powders

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Aaron J. Becker, Thomas N. Meyer, Frances N. Smith and Jon F. Edd

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-335 (About DOI)

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Plasma Deposited Ni-Al-Mo Metal-Metal Composites Plasma Deposited Ni-Al-Mo Metal-Metal Composites

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M. R. Jackson and P. A. Siemers

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-347 (About DOI)

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Stability Studies of Plasma Sprayed Zirconia Stability Studies of Plasma Sprayed Zirconia

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Harry E. Eaton and Richard C. Novak

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-353 (About DOI)

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Reduction of Selected Metal Oxides in a Thermal Plasma Produced by a Nontransferred ARC Torch Reduction of Selected Metal Oxides in a Thermal Plasma Produced by a Nontransferred ARC Torch

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Brent A. Detering, James A. Batdorf and Chien M. Wai

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-359 (About DOI)

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Plasma Studies in Vacuum ARC Remelting Plasma Studies in Vacuum ARC Remelting

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Rodney L. Williamson, Frank. J. Zanner, Lee A. Bertram and Henry C. Peebles

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-365 (About DOI)

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The Effects of Gas Composition and Pressure on RF Plasma Sintering of MgO The Effects of Gas Composition and Pressure on RF Plasma Sintering of MgO

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Peter C. Kong, Y. C. Lau and E. Pfender

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-371 (About DOI)

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Beta-SiC Synthesis in a Thermal Argon Plasma Jet Reactor Beta-SiC Synthesis in a Thermal Argon Plasma Jet Reactor

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Peter C. Kong and E. Pfender

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-377 (About DOI)

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Materials Synthesis Materials Synthesis

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Peter R. Strutt and Julian P. Partridge

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-385 (About DOI)

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Thermal Reduction of Ilmenite Concentrates in a DC Transferred-ARC Plasma Furnace Thermal Reduction of Ilmenite Concentrates in a DC Transferred-ARC Plasma Furnace

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A. D. Brent and K. J. Reid

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-399 (About DOI)

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Advanced Powder Feeding Device for Use in Gas/Solid Plasma Synthesis and Processing Applications Advanced Powder Feeding Device for Use in Gas/Solid Plasma Synthesis and Processing Applications

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F. W. Giacobbe

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-405 (About DOI)

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Design and Commissioning of a Continuous Transferred ARC Plasma Melter for the Vitrification of Nuclear Waste Design and Commissioning of a Continuous Transferred ARC Plasma Melter for the Vitrification of Nuclear Waste

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R. J. Munz and G. Q. Chen

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-417 (About DOI)

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High Power Glow Discharge Using Gas Injection Multiple Porous Electrodes High Power Glow Discharge Using Gas Injection Multiple Porous Electrodes

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J. E. Harry and D. R. Evans

MRS Proceedings / Volume 98 / 1987

DOI: http://dx.doi.org/10.1557/PROC-98-425 (About DOI)

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