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Table of Contents - March 2003 - Volume 18 , Issue 03
Parmanand Sharma, Sanjeev Kumar and K. Sreenivas
Copyright © Materials Research Society 2003
Published online: 31 January 2011
DOI: http://dx.doi.org/10.1557/JMR.2003.0069 (About DOI)
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Shuxi Zhou, Yanxiong Ke, Jianmin Li, Shemin Lu, Guien Zhou and Shuyuan Zhang
DOI: http://dx.doi.org/10.1557/JMR.2003.0070 (About DOI)
Chung-Hsin Lu and Yueh Lin
DOI: http://dx.doi.org/10.1557/JMR.2003.0071 (About DOI)
M. T. Buscaglia, M. Leoni, M. Viviani, V. Buscaglia, A. Martinelli, A. Testino and P. Nanni
DOI: http://dx.doi.org/10.1557/JMR.2003.0072 (About DOI)
Hiroshi Iwanaga, Takeshi Hashishin, Seiji Motojima, Masaki Ichihara and Shin Takeuchi
DOI: http://dx.doi.org/10.1557/JMR.2003.0073 (About DOI)
Dong Seok Seo, Hwan Kim, Hang Chul Jung and Jong Kook Lee
DOI: http://dx.doi.org/10.1557/JMR.2003.0074 (About DOI)
X. J. Zheng, Y. C. Zhou and H. Zhong
DOI: http://dx.doi.org/10.1557/JMR.2003.0075 (About DOI)
J. B. LeBret and M. G. Norton
DOI: http://dx.doi.org/10.1557/JMR.2003.0076 (About DOI)
Francis J. Allison, David M. Grant, Karen McKinlay, Craig Bailey and Philip G. Harrison
DOI: http://dx.doi.org/10.1557/JMR.2003.0077 (About DOI)
Zaoli Zhang and Min Gao
DOI: http://dx.doi.org/10.1557/JMR.2003.0078 (About DOI)
R. Sahoo, S. K. Bhattacharya and R. Debnath
DOI: http://dx.doi.org/10.1557/JMR.2003.0079 (About DOI)
Xiongwei Jiang, Jianrong Qiu, Youyu Fan, Hefang Hu and Congshan Zhu
DOI: http://dx.doi.org/10.1557/JMR.2003.0080 (About DOI)
Moon-Seog Jin, Jae-Yeol Kim, Koung-Suk Kim, Sung-Hyu Choe and Ho-Jun Song
DOI: http://dx.doi.org/10.1557/JMR.2003.0081 (About DOI)
Hacène Boukari, Andrew J. Allen, Gabrielle G. Long, Jan Ilavsky, Jay S. Wallace, Christopher C. Berndt and Herbert Herman
DOI: http://dx.doi.org/10.1557/JMR.2003.0082 (About DOI)
Dalibor Vojtěch, Elšad Tagiev, Čstmír Barta, Čestmír Barta, Jan Šerák, Petr Janda and Ondřej Eckert
DOI: http://dx.doi.org/10.1557/JMR.2003.0083 (About DOI)
Y. M. Wang, J. B. Qiang, C. H. Wong, C. H. Shek and C. Dong
DOI: http://dx.doi.org/10.1557/JMR.2003.0084 (About DOI)
J. H. Zhang, P. Zhan, Z. L. Wang, W. Y. Zhang and N. B. Ming
DOI: http://dx.doi.org/10.1557/JMR.2003.0085 (About DOI)
Lixiang Jiang, Shiyu He and Dezhuang Yang
DOI: http://dx.doi.org/10.1557/JMR.2003.0086 (About DOI)
F. M. Pontes, S. H. Leal, P. S. Pizani, M. R. M. C. Santos, E. R. Leite, E. Longo, F. Lanciotti, T. M. Boschi and J. A. Varela
DOI: http://dx.doi.org/10.1557/JMR.2003.0087 (About DOI)
Y. Zhang, H. Tan, H. Z. Kong, B. Yao and Y. Li
DOI: http://dx.doi.org/10.1557/JMR.2003.0088 (About DOI)
K. Nakane, T. Ogihara, N. Ogata and Y. Kurokawa
DOI: http://dx.doi.org/10.1557/JMR.2003.0089 (About DOI)
Y. Xu, A. Goyal, N. A. Rutter, D. Shi, M. Paranthaman, S. Sathyamurthy, P. M. Martin and D. M. Kroeger
DOI: http://dx.doi.org/10.1557/JMR.2003.0090 (About DOI)
Tae-Gon Kim, Jeongmin Oh, Taeho Moon, Yongjo Kim, Byungwoo Park, Young-Taek Lee and Sangwook Nam
DOI: http://dx.doi.org/10.1557/JMR.2003.0091 (About DOI)
Chen-Lung Fan, Daniel Ciardullo and Wayne Huebner
DOI: http://dx.doi.org/10.1557/JMR.2003.0092 (About DOI)
M. Endo, Y. J. Kim, K. Ishii, T. Inoue, T. Nomura, N. Miyashita and M. S. Dresselhaus
DOI: http://dx.doi.org/10.1557/JMR.2003.0093 (About DOI)
V. Paidar, K. Kishida and M. Yamaguchi
DOI: http://dx.doi.org/10.1557/JMR.2003.0094 (About DOI)
Wei Feng, Tierui Zhang, Jun Liu, Ran Lu, Yingying Zhao and Jiannian Yao
DOI: http://dx.doi.org/10.1557/JMR.2003.0095 (About DOI)
Yung-Kuan Tseng, I-Nan Lin, Kuo-Shung Liu, Tzer-Shen Lin and I-Cherng Chen
DOI: http://dx.doi.org/10.1557/JMR.2003.0096 (About DOI)
J. Lou, P. Shrotriya, T. Buchheit, D. Yang and W. O. Soboyejo
Published online: 26 July 2012
DOI: http://dx.doi.org/10.1557/JMR.2003.0097 (About DOI)
Sun-Jae Kim, Jong-Kuk Lee, Eun Gu Lee, Hee-Gyoun Lee, Seon-Jin Kim and Kyoung Sub Lee
DOI: http://dx.doi.org/10.1557/JMR.2003.0098 (About DOI)
Seok-Joo Lee, Jae-Eun Kim and Hae Yong Park
DOI: http://dx.doi.org/10.1557/JMR.2003.0099 (About DOI)
Shuhui Yu, Kui Yao, Santiranjan Shannigrahi and Francis Tay Eng Hock
DOI: http://dx.doi.org/10.1557/JMR.2003.0100 (About DOI)