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Table of Contents - 01 December 2001 - Volume 16 , Issue 12
Dawei Gong, Craig A. Grimes, Oomman K. Varghese, Wenchong Hu, R. S. Singh, Zhi Chen and Elizabeth C. Dickey
Copyright © Materials Research Society 2001
Published online: 31 January 2011
DOI: http://dx.doi.org/10.1557/JMR.2001.0457 (About DOI)
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E. Todd Ryan, Jeremy Martin, Kurt Junker, Jeff Wetzel, David W. Gidley and Jianing Sun
DOI: http://dx.doi.org/10.1557/JMR.2001.0458 (About DOI)
M. P. Siegal, J. T. Dawley and D. L. Overmyer
DOI: http://dx.doi.org/10.1557/JMR.2001.0459 (About DOI)
X. F. Tang, L. M. Zhang, R. Z. Yuan, L. D. Chen, T. Goto, T. Hirai, J. S. Dyck, W. Chen and C. Uher
DOI: http://dx.doi.org/10.1557/JMR.2001.0460 (About DOI)
S. J. Lloyd, J. M. Molina-Aldareguia and W. J. Clegg
DOI: http://dx.doi.org/10.1557/JMR.2001.0461 (About DOI)
Te-Fu Chang and Li Chang
DOI: http://dx.doi.org/10.1557/JMR.2001.0462 (About DOI)
Dylan E. Haas and Dunbar P. Birnie
DOI: http://dx.doi.org/10.1557/JMR.2001.0463 (About DOI)
Yuan-fang Liu, Jing-hui Zeng, Wei-xin Zhang, Wei-chao Yu, Yi-tai Qian, Jin-bo Cao and Wan-qun Zhang
DOI: http://dx.doi.org/10.1557/JMR.2001.0464 (About DOI)
K. L. Kendig, R. Gibala and D. B. Miracle
DOI: http://dx.doi.org/10.1557/JMR.2001.0465 (About DOI)
Min Li, C. Barry Carter, Marc A. Hillmyer and William W. Gerberich
DOI: http://dx.doi.org/10.1557/JMR.2001.0466 (About DOI)
Junji Saida, Chunfei Li, Mitsuhide Matsushita and Akihisa Inoue
DOI: http://dx.doi.org/10.1557/JMR.2001.0467 (About DOI)
M. Endo, Y. J. Kim, T. Maeda, K. Koshiba, K. Katayam and M. S. Dresselhaus
DOI: http://dx.doi.org/10.1557/JMR.2001.0468 (About DOI)
J. Q. Hu, B. Deng, K. B. Tang, C. R. Wang and Y. T. Qian
DOI: http://dx.doi.org/10.1557/JMR.2001.0469 (About DOI)
P. Serra, J. M. Miguel, J. L. Morenza and J. M. Guilemany
DOI: http://dx.doi.org/10.1557/JMR.2001.0470 (About DOI)
J. J. Nainaparampil and J. S. Zabinski
DOI: http://dx.doi.org/10.1557/JMR.2001.0471 (About DOI)
W. J. Zhang and S. Matsumoto
DOI: http://dx.doi.org/10.1557/JMR.2001.0472 (About DOI)
J. S. Wu, C. L. Jia, K. Urban, J. H. Hao and X. X. Xi
DOI: http://dx.doi.org/10.1557/JMR.2001.0473 (About DOI)
F. Zhou, J. Lee, S. Dallek and E. J. Lavernia
DOI: http://dx.doi.org/10.1557/JMR.2001.0474 (About DOI)
X. F. Pan, H. F. Zhang, A. M. Wang, B. Z. Ding and Z. Q. Hu
DOI: http://dx.doi.org/10.1557/JMR.2001.0475 (About DOI)
H. R. Xia, L. X. Li, H. Yu, S. M. Dong, J. Y. Wang, Q. M. Lu, C. Q. Ma and X. N. Wang
DOI: http://dx.doi.org/10.1557/JMR.2001.0476 (About DOI)
P. Deb and A. Basumallick
DOI: http://dx.doi.org/10.1557/JMR.2001.0477 (About DOI)
Cheol Seong Hwang
DOI: http://dx.doi.org/10.1557/JMR.2001.0478 (About DOI)
Xinghang Zhang, Haiyan Wang, Magdy Kassem, Jagdish Narayan and Carl C. Koch
DOI: http://dx.doi.org/10.1557/JMR.2001.0479 (About DOI)
Mao Wen, Xue-Jun Xu, Seiji Fukuyama and Kiyoshi Yokogawa
DOI: http://dx.doi.org/10.1557/JMR.2001.0480 (About DOI)
J. Find, S.C. Emerson, I.M. Krausz and W.R. Moser
DOI: http://dx.doi.org/10.1557/JMR.2001.0481 (About DOI)
S. W. Wang, L. D. Chen, T. Hirai and Jingkun Guo
DOI: http://dx.doi.org/10.1557/JMR.2001.0482 (About DOI)
Chun-Nan Lin and Shyan-Lung Chung
DOI: http://dx.doi.org/10.1557/JMR.2001.0483 (About DOI)
Ai-Dong Li, Tao Yu, Hui-Qin Ling, Di Wu, Zhi-Guo Liu and Nai-Ben Ming
DOI: http://dx.doi.org/10.1557/JMR.2001.0484 (About DOI)
Jim H. Lee, Robert K. Prud'homme and Ilhan A. Aksay
DOI: http://dx.doi.org/10.1557/JMR.2001.0485 (About DOI)
Yeong-Shyung Chou, K. Kerstetter, L. R. Pederson and R. E. Williford
DOI: http://dx.doi.org/10.1557/JMR.2001.0486 (About DOI)
J. García-Serrano, N. Koshizaki, T. Sasaki, G. Martínez-Montes and U. Pal
DOI: http://dx.doi.org/10.1557/JMR.2001.0487 (About DOI)
Todd S. Gross, Nazri bin Kamsah and Igor I. Tsukrov
DOI: http://dx.doi.org/10.1557/JMR.2001.0488 (About DOI)
Xiaoling Zhang, W. Lauwerens, L. Stals, Jiawen He and J-P. Celis
DOI: http://dx.doi.org/10.1557/JMR.2001.0489 (About DOI)
M. A. H. Donners, L. J. M. G. Dortmans, G. de With and M. J. M. de Graaf
DOI: http://dx.doi.org/10.1557/JMR.2001.0490 (About DOI)
Hye Ryoung Kim, Seehwa Jeong, Chung Bae Jeon, Oh Seong Kwon, Cheol Seong Hwang, Young Ki Han, Doo Young Yang and Ki Young Oh
DOI: http://dx.doi.org/10.1557/JMR.2001.0491 (About DOI)
W. M. Wang, X. F. Bian, H. R. Wang, Zhen Wang, L. Zhang, Z. G. Liu and J-M. Liu
DOI: http://dx.doi.org/10.1557/JMR.2001.0492 (About DOI)
A. J. Pedraza, S. Jesse, Y. F. Guan and J. D. Fowlkes
DOI: http://dx.doi.org/10.1557/JMR.2001.0493 (About DOI)
H. X. Zhang, C. H. Kam, Y. Zhou, X. Q. Han, S. D. Cheng, C. Y. Chan and Y. L. Lam
DOI: http://dx.doi.org/10.1557/JMR.2001.0494 (About DOI)
G. L. Li, M. Liu and G. H. Wang
DOI: http://dx.doi.org/10.1557/JMR.2001.0495 (About DOI)
Sun-Jae Kim, Wonhee Lee, Won-Jun Lee, Soon Dong Park, Jae Sung Song and Eun Gu Lee
DOI: http://dx.doi.org/10.1557/JMR.2001.0496 (About DOI)
Manuel Luis B. Palacio, Yongquiang Wang and William W. Gerberich
DOI: http://dx.doi.org/10.1557/JMR.2001.0497 (About DOI)