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Table of Contents - Volume 646, Symposium N – High-Temperature Ordered Intermetallic Alloys IX - 2000
Editors: S. Hanada, K.J. Hemker, R.D. Noebe, G. Sauthoff, J.H. Schneibel
Fritz Appel, Helmut Clemens and Michael Oehring
Copyright © Materials Research Society 2001
DOI: http://dx.doi.org/10.1557/PROC-646-N1.1.1 (About DOI)
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M. Khantha, V. Vitek and D. P. Pope
DOI: http://dx.doi.org/10.1557/PROC-646-N1.11.1 (About DOI)
S.C. Deevi, W.J. Zhang, C.T. Liu and B.V. Reddy
DOI: http://dx.doi.org/10.1557/PROC-646-N1.2.1 (About DOI)
Wolfram Schillinger, Dezhi Zhang, Gerhard Dehm, Arno Bartels and Helmut Clemens
DOI: http://dx.doi.org/10.1557/PROC-646-N1.4.1 (About DOI)
Arno Bartels, Wolfram Schillinger, Anita Chatterjee and Helmut Clemens
DOI: http://dx.doi.org/10.1557/PROC-646-N1.5.1 (About DOI)
G. B. Viswanathan, S. Karthikeyan, V. K. Vasudevan and M. J. Mills
DOI: http://dx.doi.org/10.1557/PROC-646-N1.6.1 (About DOI)
J. Lou, C. Mercer and W.O. Soboyejo
DOI: http://dx.doi.org/10.1557/PROC-646-N1.7.1 (About DOI)
Fritz Appel
DOI: http://dx.doi.org/10.1557/PROC-646-N1.8.1 (About DOI)
P. Wang, N. Bhate, K.S. Chan and K.S. Kumar
DOI: http://dx.doi.org/10.1557/PROC-646-N1.9.1 (About DOI)
T. Koyama, M. Doi and S. Naito
DOI: http://dx.doi.org/10.1557/PROC-646-N2.2.1 (About DOI)
Yukichi Umakoshi, Takayoshi Nakano and Masafumi Azuma
DOI: http://dx.doi.org/10.1557/PROC-646-N2.5.1 (About DOI)
B.P. Bewlay, C.L. Briant, E.T. Sylven, M.R. Jackson and G. Xiao
DOI: http://dx.doi.org/10.1557/PROC-646-N2.6.1 (About DOI)
B.P. Bewlay, C.L. Briant, A.W. Davis and M.R. Jackson
DOI: http://dx.doi.org/10.1557/PROC-646-N2.7.1 (About DOI)
Kimiko Kakubo, Yoshisato Kimura and Yoshinao Mishima
DOI: http://dx.doi.org/10.1557/PROC-646-N2.9.1 (About DOI)
C. García-Oca, D.G. Morris, M.A. Muñoz-Morris and S.C. Deevi
DOI: http://dx.doi.org/10.1557/PROC-646-N3.1.1 (About DOI)
Tohru Takahashi and Tadashi Hasegawa
DOI: http://dx.doi.org/10.1557/PROC-646-N3.10.1 (About DOI)
Robert A. Varin, Les Zbroniec and Zhi Gang Wang
DOI: http://dx.doi.org/10.1557/PROC-646-N3.11.1 (About DOI)
D. Wu and I. Baker
DOI: http://dx.doi.org/10.1557/PROC-646-N3.2.1 (About DOI)
Su-Ming Zhu, Makoto Tamura, Kazushi Sakamoto and Kunihiko Iwasaki
DOI: http://dx.doi.org/10.1557/PROC-646-N3.3.1 (About DOI)
Anna Fraczkiewicz, Anne-Sophie Gay, Emmanuel Cadel and Didier Blavette
DOI: http://dx.doi.org/10.1557/PROC-646-N3.4.1 (About DOI)
M. Wittmann, I. Baker and N.D. Evans
DOI: http://dx.doi.org/10.1557/PROC-646-N3.5.1 (About DOI)
Yoko Yamabe-Mitarai
DOI: http://dx.doi.org/10.1557/PROC-646-N3.6.1 (About DOI)
X. Yu, Y. Yamabe-Mitarai, Y. Ro, S. Nakaza and H. Harada
DOI: http://dx.doi.org/10.1557/PROC-646-N3.7.1 (About DOI)
Man H. Yoo
DOI: http://dx.doi.org/10.1557/PROC-646-N4.10.1 (About DOI)
J. G. Swadener, Isa Rosales and Joachim H. Schneibel
DOI: http://dx.doi.org/10.1557/PROC-646-N4.2.1 (About DOI)
K. Tanaka, K. Nawata, H. Inui, M. Yamaguchi and M. Koiwa
DOI: http://dx.doi.org/10.1557/PROC-646-N4.3.1 (About DOI)
J.H. Perepezko, R. Sakidja and S. Kim
DOI: http://dx.doi.org/10.1557/PROC-646-N4.5.1 (About DOI)
Kazuhiro Ito, Hironori Yoshioka and Masaharu Yamaguchi
DOI: http://dx.doi.org/10.1557/PROC-646-N4.6.1 (About DOI)
A. Misra, A.A. Sharif, J. J. Petrovic and T. E. Mitchell
DOI: http://dx.doi.org/10.1557/PROC-646-N4.7.1 (About DOI)
M. Friák, M. Šob and V. Vitek
DOI: http://dx.doi.org/10.1557/PROC-646-N4.8.1 (About DOI)
Haruyuki Inui, Koji Ishikawa and Masaharu Yamaguchi
DOI: http://dx.doi.org/10.1557/PROC-646-N4.9.1 (About DOI)
I. Baker, D. Wu and E. P. George
DOI: http://dx.doi.org/10.1557/PROC-646-N5.1.1 (About DOI)
P. Oramus, R. Kozubski, V. Pierron-Bohnes, M.C. Cadeville and W. Pfeiler
DOI: http://dx.doi.org/10.1557/PROC-646-N5.10.1 (About DOI)
H. Schweiger, R. Podloucky, W. Wolf, W. Püschl and W. Pfeiler
DOI: http://dx.doi.org/10.1557/PROC-646-N5.11.1 (About DOI)
Toshiyuki Hirano, Masahiko Demura, Kyosuke Kishida and Yozo Suga
DOI: http://dx.doi.org/10.1557/PROC-646-N5.12.1 (About DOI)
Tomas Kruml, Birgit Lo Piccolo and Jean-Luc Martin
DOI: http://dx.doi.org/10.1557/PROC-646-N5.13.1 (About DOI)
Christophe Coupeau, Tomas Kruml and Joël Bonneville
DOI: http://dx.doi.org/10.1557/PROC-646-N5.14.1 (About DOI)
Seiji Miura, Juri Fujinaka, Rikiya Nino and Tetsuo Mohri
DOI: http://dx.doi.org/10.1557/PROC-646-N5.15.1 (About DOI)
Satoshi Semboshi, Naoya Masahashi and Shuji Hanada
DOI: http://dx.doi.org/10.1557/PROC-646-N5.16.1 (About DOI)
Su-Ming Zhu, Kazushi Sakamoto, Makoto Tamura and Kunihiko Iwasaki
DOI: http://dx.doi.org/10.1557/PROC-646-N5.18.1 (About DOI)
B.G. Park, S.H. Ko and Y.H. Park
DOI: http://dx.doi.org/10.1557/PROC-646-N5.19.1 (About DOI)
J. Chao, M.A. Muñoz-Morris, J.L. Gonzalez-Carrasco and D.G. Morris
DOI: http://dx.doi.org/10.1557/PROC-646-N5.2.1 (About DOI)
Seiji Miura, Hiroaki Ishii and Tetsuo Mohri
DOI: http://dx.doi.org/10.1557/PROC-646-N5.20.1 (About DOI)
Kazuyuki Handa, Yoshisato Kimura and Yoshinao Mishima
DOI: http://dx.doi.org/10.1557/PROC-646-N5.21.1 (About DOI)
Kouji Hagihara, Takayoshi Nakano and Yukichi Umakoshi
DOI: http://dx.doi.org/10.1557/PROC-646-N5.23.1 (About DOI)
Feng Huang, William S. Epling, John A. Barnard and Mark L. Weaver
DOI: http://dx.doi.org/10.1557/PROC-646-N5.24.1 (About DOI)
T. Takasugi, Y. Kaneno and H. Inoue
DOI: http://dx.doi.org/10.1557/PROC-646-N5.26.1 (About DOI)
Y. Kaneno and T. Takasugi
DOI: http://dx.doi.org/10.1557/PROC-646-N5.27.1 (About DOI)
Sebastien Rosset, E. Cefalu, Louis W. Varner and David R. Johnson
DOI: http://dx.doi.org/10.1557/PROC-646-N5.28.1 (About DOI)
Y. Furuya and H. Zhirong
DOI: http://dx.doi.org/10.1557/PROC-646-N5.30.1 (About DOI)
R. de Coss, A. Aguayo and G. Murrieta
DOI: http://dx.doi.org/10.1557/PROC-646-N5.33.1 (About DOI)
M. Akasaka, G. Sakuragi, H. Suzuki, T. Iida, Y. Takanashi and S. Sakuragi
DOI: http://dx.doi.org/10.1557/PROC-646-N5.34.1 (About DOI)
Takayoshi Nakano, Yasuhiro Nakai and Yukichi Umakoshi
DOI: http://dx.doi.org/10.1557/PROC-646-N5.35.1 (About DOI)
Fu-Gao Wei, Yoshisato Kimura and Yoshinao Mishima
DOI: http://dx.doi.org/10.1557/PROC-646-N5.37.1 (About DOI)
Yoshisato Kimura, Kentaro Shindo and Yoshinao Mishima
DOI: http://dx.doi.org/10.1557/PROC-646-N5.38.1 (About DOI)
C.L. Ma, Y. Tan, H. Tanaka, A. Kasama, R. Tanaka, Y. Mishima and S. Hanada
DOI: http://dx.doi.org/10.1557/PROC-646-N5.39.1 (About DOI)
Joachim H. Schneibel, Claudia J. Rawn and Chong Long Fu
DOI: http://dx.doi.org/10.1557/PROC-646-N5.40.1 (About DOI)
Hisatoshi Hirai, Tatsuo Tabaru, Jiangbo Sha, Hidetoshi Ueno, Akira Kitahara and Shuji Hanada
DOI: http://dx.doi.org/10.1557/PROC-646-N5.41.1 (About DOI)
Sungtae Kim, R. Sakidja, Z. F. Dong, J. H. Perepezko and Yeon Wook Kim
DOI: http://dx.doi.org/10.1557/PROC-646-N5.42.1 (About DOI)
S. Wang, D. Fort, I. P. Jones and J. S. Abell
DOI: http://dx.doi.org/10.1557/PROC-646-N5.43.1 (About DOI)
M. Nazmy, M. Staubli, G. Onofrio and V. Lupinc
DOI: http://dx.doi.org/10.1557/PROC-646-N5.44.1 (About DOI)
Fabienne Grégori and Patrick Veyssière
DOI: http://dx.doi.org/10.1557/PROC-646-N5.45.1 (About DOI)
Bin Zhao, Jian Sun, Jiansheng Wu and Fei Wang
DOI: http://dx.doi.org/10.1557/PROC-646-N5.46.1 (About DOI)
John K. Vassiliou, J.W. Otto, G. Frommeyer, A. J. Viescas, K. Bulusu and H. Bellumkonda
DOI: http://dx.doi.org/10.1557/PROC-646-N5.47.1 (About DOI)