To access subscriptions and personalised features please log in or register
MRS Online Proceedings Library Home
Save Journal to My CJO Account
Browse Journal
Browse Articles
Table of Contents - Volume 1284, Symposium C – Fundamentals of Low-Dimensional Carbon Nanomaterials - 2011
Felix Börrnert, Alicja Bachmatiuk, Sandeep Gorantla, Jamie H. Warner, Bernd Büchner and Mark H. Rümmeli
Copyright © Materials Research Society 2011
DOI: http://dx.doi.org/10.1557/opl.2011.221 (About DOI)
Post a Comment
Adrianus I. Aria, Adi W. Gani and Morteza Gharib
DOI: http://dx.doi.org/10.1557/opl.2011.222 (About DOI)
Jason Reppert, Ramakrishna Podila, Nan Li, Codruta Z. Loebick, Steven J. Stuart, Lisa D. Pfefferle and Apparao M. Rao
DOI: http://dx.doi.org/10.1557/opl.2011.223 (About DOI)
Mark H. Rümmeli, Alicja Bachmatiuk, Arezoo Dianat, Andrew Scott, Felix Börrnert, Imad Ibrahim, Shasha Zhang, Ewa Borowiak-Palen, Gianaurelio Cuniberti and Bernd Büchner
DOI: http://dx.doi.org/10.1557/opl.2011.218 (About DOI)
Yogeeswaran Ganesan, Cheng Peng, Lijie Ci, Valery Khabashesku, Pulickel M. Ajayan and Jun Lou
DOI: http://dx.doi.org/10.1557/opl.2011.225 (About DOI)
Qiang Lu and Rui Huang
DOI: http://dx.doi.org/10.1557/opl.2011.226 (About DOI)
Gustavo Brunetto, Sergio B. Legoas, Vitor R. Coluci, Liacir S. Lucena and Douglas S. Galvao
DOI: http://dx.doi.org/10.1557/opl.2011.227 (About DOI)
Shigekazu Ohmori, Takeshi Saito, Bikau Shukla, Motoo Yumura and Sumio Iijima
DOI: http://dx.doi.org/10.1557/opl.2011.228 (About DOI)
Andrew Basteev, Leonid Bazyma, Mykhaylo Ugryumov, Yuriy Chernishov and Margarita Slepicheva
DOI: http://dx.doi.org/10.1557/opl.2011.224 (About DOI)
W. C. Mitchel, J. H. Park, Howard E. Smith, L. Grazulis, S. Mou, D. Tomich, K. Eyink and Said Elhamri
DOI: http://dx.doi.org/10.1557/opl.2011.638 (About DOI)
Katsuya Nozawa, Nozomu Matsukawa, Kenji Toyoda and Shigeo Yoshii
DOI: http://dx.doi.org/10.1557/opl.2011.639 (About DOI)
Alicja Bachmatiuk, Felix Börrnert, Imad Ibrahim, Bernd Büchner and Mark H. Rümmeli
DOI: http://dx.doi.org/10.1557/opl.2011.640 (About DOI)
Pedro A. S. Autreto, Marcelo Z. Flores, Sergio B. Legoas, Ricardo P. B. Santos and Douglas S. Galvao
DOI: http://dx.doi.org/10.1557/opl.2011.641 (About DOI)
Nobuyuki Iwata, Daiki Koide, Syouta Katou, Eri Ikeda and Hiroshi Yamamoto
DOI: http://dx.doi.org/10.1557/opl.2011.642 (About DOI)
Shin Mou, J. J. Boeckl, L. Grazulis, B. Claflin, Weijie Lu, J. H. Park and W. C. Mitchel
DOI: http://dx.doi.org/10.1557/opl.2011.643 (About DOI)
M. Mahjouri-Samani, Y. S. Zhou, W. Xiong, Y. Gao, M. Mitchell and Y. F. Lu
DOI: http://dx.doi.org/10.1557/opl.2011.644 (About DOI)
Daire Cott, Masahito Sugiura, Nicolo Chiodarelli, Kai Arstila, Philipe M. Vereecken, Bart Vereecke, Sven Van Elshocht and Stefan De Gendt
DOI: http://dx.doi.org/10.1557/opl.2011.645 (About DOI)
J. Inoue, T. Hiraiwa, R. Sato, A. Yamamura, S. Honda and H. Itoh
DOI: http://dx.doi.org/10.1557/opl.2011.646 (About DOI)
Shunji Bandow, Hirohito Asano, Susumu Muraki, Takahiro Mizuno, Makoto Jinno and Sumio Iijima
DOI: http://dx.doi.org/10.1557/opl.2011.647 (About DOI)
Simon Einwächter and Michael Krüger
DOI: http://dx.doi.org/10.1557/opl.2011.648 (About DOI)
S. G. Chou, Z. Ahmed, G.G. Samsonidze, J. Kong, M. S. Dresselhaus and D. F. Plusquellic
DOI: http://dx.doi.org/10.1557/opl.2011.365 (About DOI)
Michail Obolensky, Andrew Kravchenko, Vladimir Beletsky, Yuri Petrusenko, Valeriy Borysenko, Sergey Lavrynenko, Andrew Basteev and Leonid Bazyma
DOI: http://dx.doi.org/10.1557/opl.2011.649 (About DOI)
L. Sun, T.-H. Teng, Md. H. Rashid, M. Krysmann, P. Dallas, Y. Wang, B.-R. Hyun, A. C. Bartnik, G. G. Malliaras, F. W. Wise and E. P. Giannelis
DOI: http://dx.doi.org/10.1557/opl.2011.650 (About DOI)
Katherine L. Saenger, Christian Lavoie, Roy Carruthers, Ageeth A. Bol, Timothy J. Mcardle, Jack O. Chu, James C. Tsang and Alfred Grill
DOI: http://dx.doi.org/10.1557/opl.2011.219 (About DOI)
Leonardo D. Machado, Sergio B. Legoas, Jaqueline S. Soares, Nitzan Shadmi, Ado Jorio, Ernesto Joselevich and Douglas S. Galvao
DOI: http://dx.doi.org/10.1557/opl.2011.220 (About DOI)
DOI: http://dx.doi.org/10.1557/opl.2011.688 (About DOI)