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Table of Contents - February 2008 - Volume 23 , Issue 02
D.J. Oliver, B.R. Lawn, R.F. Cook, M.G. Reitsma, J.E. Bradby, J.S. Williams and P. Munroe
Copyright © Materials Research Society 2007
Published online: 31 January 2011
DOI: http://dx.doi.org/10.1557/JMR.2008.0070 (About DOI)
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Dashan Shang, Lidong Chen, Qun Wang, Zihua Wu, Wenqing Zhang and Xiaomin Li
DOI: http://dx.doi.org/10.1557/JMR.2008.0072 (About DOI)
Gregory J. Taft, Matthew T. Newby, Joel J. Hrebik, Marshall Onellion, Thomas F. George, Dániel Szentesi, Sándor Szatmári and László Nánai
DOI: http://dx.doi.org/10.1557/JMR.2008.0039 (About DOI)
Yunchang Xin, Chenglong Liu, Wenjun Zhang, Kaifu Huo, Guoyi Tang, Xiubo Tian and Paul K. Chu
DOI: http://dx.doi.org/10.1557/JMR.2008.0040 (About DOI)
M.L. Wang, X. Hui and G.L. Chen
DOI: http://dx.doi.org/10.1557/JMR.2008.0041 (About DOI)
C. Gaire, D-X. Ye, T-M. Lu, G-C. Wang and R.C. Picu
DOI: http://dx.doi.org/10.1557/JMR.2008.0061 (About DOI)
X. Yao, Z.H. Zhu, H.M. Cheng and G.Q. Lu
DOI: http://dx.doi.org/10.1557/JMR.2008.0063 (About DOI)
W.Z. Li, Y. Yao, Q.M. Wang, Z.B. Bao, J. Gong, C. Sun and X. Jiang
DOI: http://dx.doi.org/10.1557/JMR.2008.0062 (About DOI)
Hong-Da Ko and Chien-Cheng Lin
DOI: http://dx.doi.org/10.1557/JMR.2008.0073 (About DOI)
L.F. He, Z.J. Lin, Y.W. Bao, M.S. Li, J.Y. Wang and Y.C. Zhou
DOI: http://dx.doi.org/10.1557/JMR.2008.0042 (About DOI)
X. Qiu, J. Graeter, L. Kecskes and J. Wang
DOI: http://dx.doi.org/10.1557/JMR.2008.0043 (About DOI)
A.C. Lewis, C. Eberl, K.J. Hemker and T.P. Weihs
DOI: http://dx.doi.org/10.1557/JMR.2008.0044 (About DOI)
Z-S. Choi, R. Mönig and C.V. Thompson
DOI: http://dx.doi.org/10.1557/JMR.2008.0054 (About DOI)
J.H. Yao, H. Yang, J. Zhang, J.Q. Wang and Y. Li
DOI: http://dx.doi.org/10.1557/JMR.2008.0055 (About DOI)
Dong Yu Lu, Jian Chen, Shao Zhi Deng, Ning Sheng Xu and Wei Hong Zhang
DOI: http://dx.doi.org/10.1557/JMR.2008.0056 (About DOI)
L. Xu, W.J. Tian, X.F. Wu, J.G. Cao, L.W. Zhou, J.P. Huang and G.Q. Gu
DOI: http://dx.doi.org/10.1557/JMR.2008.0057 (About DOI)
J. Farjas and P. Roura
DOI: http://dx.doi.org/10.1557/JMR.2008.0045 (About DOI)
Hu Lianxi, Li Yuping, Yuan Yuan and Shi Gang
DOI: http://dx.doi.org/10.1557/JMR.2008.0046 (About DOI)
Lingxia Zhang, Jianlin Shi, Jiangtian Li, Zile Hua and Meiling Ruan
DOI: http://dx.doi.org/10.1557/JMR.2008.0047 (About DOI)
Sung Hwan Moon, Tae Wook Heo, Sun Young Park, Jae Hyuk Kim, Young Chul Choi, Sung Il Ahn, Joohwi Lee and Hyeong Joon Kim
DOI: http://dx.doi.org/10.1557/JMR.2008.0048 (About DOI)
Hakkwan Kim and Alexander H. King
DOI: http://dx.doi.org/10.1557/JMR.2008.0049 (About DOI)
M.K. Bhide, R.M. Kadam, A.K. Tyagi, K.P. Muthe, H.G. Salunke, S.K. Gupta, A. Vinu, A. Asthana and S.V. Godbole
DOI: http://dx.doi.org/10.1557/JMR.2008.0064 (About DOI)
Satoshi Semboshi and Toyohiko J. Konno
DOI: http://dx.doi.org/10.1557/JMR.2008.0050 (About DOI)
S.I. Hong, K.H. Lee, M.E. Outslay and D.H. Kohn
DOI: http://dx.doi.org/10.1557/JMR.2008.0051 (About DOI)
Takayuki Nakane and Hiroaki Kumakura
DOI: http://dx.doi.org/10.1557/JMR.2008.0052 (About DOI)
C.K. Chung and T.S. Chen
DOI: http://dx.doi.org/10.1557/JMR.2008.0065 (About DOI)
C.J. Boehlert, S.C. Longanbach, M. Nowell and S. Wright
DOI: http://dx.doi.org/10.1557/JMR.2008.0058 (About DOI)
H. Fujii, K. Togano and K. Ozawa
DOI: http://dx.doi.org/10.1557/JMR.2008.0059 (About DOI)
Dmitri V. Louzguine-Luzgin, Takanobu Saito, Junji Saida and Akihisa Inoue
DOI: http://dx.doi.org/10.1557/JMR.2008.0066 (About DOI)
J.H. Na, E.S. Park, Y.C. Kim, E. Fleury, W.T. Kim and D.H. Kim
DOI: http://dx.doi.org/10.1557/JMR.2008.0060 (About DOI)
Nelson S. Bell, David R. Tallant, Rebecca Raymond and Timothy J. Boyle
DOI: http://dx.doi.org/10.1557/JMR.2008.0053 (About DOI)
Phoi Chin Goh, Kui Yao and Zhong Chen
DOI: http://dx.doi.org/10.1557/JMR.2008.0067 (About DOI)
R. Akhtar, M.R. Daymond, J.D. Almer and P.M. Mummery
DOI: http://dx.doi.org/10.1557/JMR.2008.0068 (About DOI)
Bilge Imer, Benjamin Haskell, Siddharth Rajan, Stacia Keller, Umesh K. Mishra, Shuji Nakamura, James S. Speck and Steven P. DenBaars
DOI: http://dx.doi.org/10.1557/JMR.2008.0069 (About DOI)
R. Peter Dillon, Dong-Kyu Kim, Joy E. Trujillo, Waltraud M. Kriven and Martha L. Mecartney
DOI: http://dx.doi.org/10.1557/JMR.2008.0071 (About DOI)
Runrun Duan, Michael S. Haluska and Robert F. Speyer
DOI: http://dx.doi.org/10.1557/JMR.2008.0074 (About DOI)
C.F. Gutiérrez-González and J.F. Bartolomé
DOI: http://dx.doi.org/10.1557/JMR.2008.0075 (About DOI)
Chien-Cheng Li, Jow-Lay Huang, Ran-Jin Lin, Hong-Ping Lin, Ding-Fwu Lii and Chuan-Pu Liu
DOI: http://dx.doi.org/10.1557/JMR.2008.0076 (About DOI)