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Table of Contents - 01 February 2005 - Volume 20 , Issue 02
J. Farjas, J. Serra-Miralles, P. Roura, E. Bertran and P. Roca i Cabarrocas
Copyright © Materials Research Society 2005
Published online: 03 March 2011
DOI: http://dx.doi.org/10.1557/JMR.2005.0037 (About DOI)
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Junping Zhao, Christopher S. Gaddis, Ye Cai and Kenneth H. Sandhage
DOI: http://dx.doi.org/10.1557/JMR.2005.0046 (About DOI)
Y.H. Zhao, X.Z. Liao, Y.T. Zhu and R.Z. Valiev
DOI: http://dx.doi.org/10.1557/JMR.2005.0057 (About DOI)
Zhaoming Zhang
DOI: http://dx.doi.org/10.1557/JMR.2005.0036 (About DOI)
G.J. Ma, C.W. Wu, W.L. Zhou, X.L. Guo, M.F. Ren and J.T. Guo
DOI: http://dx.doi.org/10.1557/JMR.2005.0047 (About DOI)
D. Di Maio and S.G. Roberts
DOI: http://dx.doi.org/10.1557/JMR.2005.0048 (About DOI)
Junji Saida, Hidemi Kato and Akihisa Inoue
DOI: http://dx.doi.org/10.1557/JMR.2005.0058 (About DOI)
D.L. Zhang, D.Y. Ying and P. Munroe
DOI: http://dx.doi.org/10.1557/JMR.2005.0059 (About DOI)
Z. Zhang, D.Q. Zhao and W.H. Wang
DOI: http://dx.doi.org/10.1557/JMR.2005.0038 (About DOI)
Caixia Kan, Weiping Cai, Cuncheng Li and Lide Zhang
DOI: http://dx.doi.org/10.1557/JMR.2005.0039 (About DOI)
Qixun Guo, Qing Yang, Lei Zhu, Chengqi Yi and Yi Xie
DOI: http://dx.doi.org/10.1557/JMR.2005.0041 (About DOI)
Gy. Horváth, N.Q. Chinh and J. Lendvai
DOI: http://dx.doi.org/10.1557/JMR.2005.0040 (About DOI)
Yue Li, Weiping Cai, Guotao Duan, Bingqiang Cao and Fengqiang Sun
DOI: http://dx.doi.org/10.1557/JMR.2005.0060 (About DOI)
John W. Phair, Sergey N. Tkachev, Murli H. Manghnani and Richard A. Livingston
DOI: http://dx.doi.org/10.1557/JMR.2005.0061 (About DOI)
Amreesh Chandra, Dhananjai Pandey, M.D. Mathews and A.K. Tyagi
DOI: http://dx.doi.org/10.1557/JMR.2005.0062 (About DOI)
Qiang Zheng, Bo Xu, Yihu Song, Hongmei Yang and Yi Pan
DOI: http://dx.doi.org/10.1557/JMR.2005.0063 (About DOI)
F. Guo, J.G. Lee, T. Hogan and K.N. Subramanian
DOI: http://dx.doi.org/10.1557/JMR.2005.0064 (About DOI)
J.B. Zhou and K.P. Rao
DOI: http://dx.doi.org/10.1557/JMR.2005.0042 (About DOI)
U. Narkiewicz, W. Arabczyk, W. Konicki and A. Pattek-Janczyk
DOI: http://dx.doi.org/10.1557/JMR.2005.0043 (About DOI)
Guangyin Yuan, Cunling Qin and Akihisa Inoue
DOI: http://dx.doi.org/10.1557/JMR.2005.0044 (About DOI)
Young-Joo Eo, Jeong Hwan Kim, Ji Hoon Ko and Byeong-Soo Bae
DOI: http://dx.doi.org/10.1557/JMR.2005.0045 (About DOI)
Jae-Won Kim, Seoung-Soo Lee, Yeon-Gil Jung, Baig-Gyu Choi, Chang-Yong Jo and Ungyu Paik
DOI: http://dx.doi.org/10.1557/JMR.2005.0049 (About DOI)
Hyoungjoon Park, Helen M. Chan and Richard P. Vinci
DOI: http://dx.doi.org/10.1557/JMR.2005.0050 (About DOI)
Chien-Chong Chen and Kuan-Tung Huang
DOI: http://dx.doi.org/10.1557/JMR.2005.0052 (About DOI)
J. Alkorta, J.M. Martínez-Esnaola and J. Gil Sevillano
DOI: http://dx.doi.org/10.1557/JMR.2005.0053 (About DOI)
Ching-Tai Cheng, Michael Lanagan, Jiang-Tsair Lin, Beth Jones and Ming-Jen Pan
DOI: http://dx.doi.org/10.1557/JMR.2005.0054 (About DOI)
A.F. Marshall, D.B. Aubertine, W.D. Nix and P.C. McIntyre
DOI: http://dx.doi.org/10.1557/JMR.2005.0065 (About DOI)
Jiin-Long Yang, J.S. Chen and S.J. Chang
DOI: http://dx.doi.org/10.1557/JMR.2005.0066 (About DOI)
Chung-Hsin Lu, Wen-Jeng Hwang and S.V. Godbole
DOI: http://dx.doi.org/10.1557/JMR.2005.0067 (About DOI)
G. Dantelle, M. Mortier, D. Vivien and G. Patriarche
DOI: http://dx.doi.org/10.1557/JMR.2005.0051 (About DOI)
Shih-Yun Chen, In-Gann Chen, Yang-Chung Liao and Maw-Kuen Wu
DOI: http://dx.doi.org/10.1557/JMR.2005.0055 (About DOI)
P.C. Wo, L. Zuo and A.H.W. Ngan
DOI: http://dx.doi.org/10.1557/JMR.2005.0056 (About DOI)
C.J. Liu and J.S. Chen
DOI: http://dx.doi.org/10.1557/JMR.2005.0068 (About DOI)
Honglin Zhu, Dale E. Niesz, Victor A. Greenhut and Robert Sabia
DOI: http://dx.doi.org/10.1557/JMR.2005.0072 (About DOI)
Wangyang Ni and Yang-Tse Cheng
DOI: http://dx.doi.org/10.1557/JMR.2005.0071 (About DOI)
Seung-Min Oh, Ji-Guang Li and Takamasa Ishigaki
DOI: http://dx.doi.org/10.1557/JMR.2005.0070 (About DOI)
J. Liu, R. Czerw and D.L. Carroll
DOI: http://dx.doi.org/10.1557/JMR.2005.0069 (About DOI)
DOI: http://dx.doi.org/10.1017/S0884291400083953 (About DOI)