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Table of Contents - April 1994 - Volume 9 , Issue 04
Greg Steinlage, Ryan Roeder, Kevin Trumble, Keith Bowman, Shi Li and Mike McElfresh
Copyright © Materials Research Society 1994
Published online: 03 March 2011
DOI: http://dx.doi.org/10.1557/JMR.1994.0833 (About DOI)
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A. Keshavaraja and A. V. Ramaswamy
DOI: http://dx.doi.org/10.1557/JMR.1994.0837 (About DOI)
Peir-Yung Chu and Relva C. Buchanan
DOI: http://dx.doi.org/10.1557/JMR.1994.0844 (About DOI)
Tomoko Goto and Tsuyoshi Takahashi
DOI: http://dx.doi.org/10.1557/JMR.1994.0852 (About DOI)
T. Manabe, W. Kondo, S. Mizuta and T. Kumagai
DOI: http://dx.doi.org/10.1557/JMR.1994.0858 (About DOI)
K. Y. Wang, A. Q. He, T. D. Shen, M. X. Quan and J. T. Wang
DOI: http://dx.doi.org/10.1557/JMR.1994.0866 (About DOI)
Zhao-Yang Xie and Diana Farkas
DOI: http://dx.doi.org/10.1557/JMR.1994.0875 (About DOI)
A. Stierle, T. Mühge and H. Zabel
DOI: http://dx.doi.org/10.1557/JMR.1994.0884 (About DOI)
George L. Schimek, Robert E. McCarley and L. Scott Chumbley
DOI: http://dx.doi.org/10.1557/JMR.1994.0891 (About DOI)
M. S. Hegde, K. M. Satyalakshmi, R. M. Mallya, M. Rajeswari and H. Zhang
DOI: http://dx.doi.org/10.1557/JMR.1994.0898 (About DOI)
Donyau Chiang and J. C. M. Li
DOI: http://dx.doi.org/10.1557/JMR.1994.0903 (About DOI)
Biao Wu, Lianwei Ren, Charles J. O'Connor, Jinke Tang, Jin-Seung Jung, Jacques Ferré and Jean-Pierre Jamet
DOI: http://dx.doi.org/10.1557/JMR.1994.0909 (About DOI)
K. L. Menningen, M. A. Childs, H. Toyoda, L. W. Anderson and J. E. Lawler
DOI: http://dx.doi.org/10.1557/JMR.1994.0915 (About DOI)
M. L. Hartsell and L. S. Piano
DOI: http://dx.doi.org/10.1557/JMR.1994.0921 (About DOI)
L. Langer, L. Stockman, J. P. Heremans, V. Bayot, C. H. Olk, C. Van Haesendonck, Y. Bruynseraede and J-P. Issi
DOI: http://dx.doi.org/10.1557/JMR.1994.0927 (About DOI)
M. M. Hoveland, J. B. Danner, J. M. Vohs and D. A. Bonnell
DOI: http://dx.doi.org/10.1557/JMR.1994.0933 (About DOI)
F. R. Chien, S. R. Nutt, W. S. Yoo, T. Kimoto and H. Matsunami
DOI: http://dx.doi.org/10.1557/JMR.1994.0940 (About DOI)
Jhing-Fang Chang and Seshu B. Desua
DOI: http://dx.doi.org/10.1557/JMR.1994.0955 (About DOI)
W. Ousi-Benomar, S.S. Xue, R.A. Lessard, A. Singh, Z. L. Wu and P. K. Kuo
DOI: http://dx.doi.org/10.1557/JMR.1994.0970 (About DOI)
Nam H. Hur, Yong K. Park, Dong H. Won and Kwangsoo No
DOI: http://dx.doi.org/10.1557/JMR.1994.0980 (About DOI)
Amitava Chakraborty, P. Sujatha Devi, Sukumar Roy and H. S. Maiti
DOI: http://dx.doi.org/10.1557/JMR.1994.0986 (About DOI)
E. Vancoille, B. Blanpain, Ye Xingpu, J-P. Celis and J. R. Roos
DOI: http://dx.doi.org/10.1557/JMR.1994.0992 (About DOI)
Tapan K. Gupta and Jau-Ho Jean
DOI: http://dx.doi.org/10.1557/JMR.1994.0999 (About DOI)
T. H. Jung and R. V. Subramanian
DOI: http://dx.doi.org/10.1557/JMR.1994.1006 (About DOI)
D. Al-Mawlawi, C. Z. Liu and Martin Moskovits
DOI: http://dx.doi.org/10.1557/JMR.1994.1014 (About DOI)
M. J. DeSilva, A. J. Pedraza and D.H. Lowndes
DOI: http://dx.doi.org/10.1557/JMR.1994.1019 (About DOI)
Takakazu Suzuki, Hiroyuki Umehara and Ryuichi Hayashi
DOI: http://dx.doi.org/10.1557/JMR.1994.1028 (About DOI)
Jeffrey I. Eldridge and Ben T. Ebihara
DOI: http://dx.doi.org/10.1557/JMR.1994.1035 (About DOI)
E. H. Lee, G. R. Rao, M. B. Lewis and L. K. Mansur
DOI: http://dx.doi.org/10.1557/JMR.1994.1043 (About DOI)