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Table of Contents - 01 October 1999 - Volume 14 , Issue 10
Shi Jin, Xuelei Wang and Thomas L. Starr
Copyright © Materials Research Society 1999
Published online: 31 January 2011
DOI: http://dx.doi.org/10.1557/JMR.1999.0515 (About DOI)
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Sang-Mo Koo, Li-Rong Zheng and K. V. Rao
DOI: http://dx.doi.org/10.1557/JMR.1999.0516 (About DOI)
R. R. Oberle, R. C. Cammarata, C. M. Su and M. Wuttig
DOI: http://dx.doi.org/10.1557/JMR.1999.0517 (About DOI)
Edward L. Dreizin, Vern K. Hoffmann and Edward P. Vicenzi
DOI: http://dx.doi.org/10.1557/JMR.1999.0518 (About DOI)
J. R. Olive, W. H. Hofmeister, R. J. Bayuzick and M. Vlasse
DOI: http://dx.doi.org/10.1557/JMR.1999.0519 (About DOI)
DOI: http://dx.doi.org/10.1557/JMR.1999.0520 (About DOI)
N. Hari Babu, W. Lo, D. A. Cardwell and Y. Shi
DOI: http://dx.doi.org/10.1557/JMR.1999.0521 (About DOI)
T. E. Stevens, J. C. Moosbrugger and F. M. Carlson
DOI: http://dx.doi.org/10.1557/JMR.1999.0522 (About DOI)
Junqing Hu, Qingyi Lu, Kaibin Tang, Yitai Qian, Guien Zhou and Xianming Liu
DOI: http://dx.doi.org/10.1557/JMR.1999.0523 (About DOI)
W. R. Sun, Z. Q. Hu, J. H. Lee, S. M. Ceo and S. J. Choe
DOI: http://dx.doi.org/10.1557/JMR.1999.0524 (About DOI)
N. Gay-Sanz, C. Prieto, A. Muñoz-Martín, A. de Andrés, M. Vázquez and Seong-Cho Yu
DOI: http://dx.doi.org/10.1557/JMR.1999.0525 (About DOI)
W. F. Gale, Y. Shen, J. W. Fergus and X. Wen
DOI: http://dx.doi.org/10.1557/JMR.1999.0526 (About DOI)
J. W. Jang, P. G. Kim, K. N. Tu and Michael Lee
DOI: http://dx.doi.org/10.1557/JMR.1999.0527 (About DOI)
A. Manzano Ramírez, F. J. Espinoza Beltrán, J. M. Yáñez-Limón, Yuri V. Vorobiev, J. González-Hernández and J. M. Hallen
DOI: http://dx.doi.org/10.1557/JMR.1999.0528 (About DOI)
Luke N. Brewer, Derrick P. Endler, Shani Austin, Vinayak P. Dravid and Joseph M. Collins
DOI: http://dx.doi.org/10.1557/JMR.1999.0529 (About DOI)
S. Wizel, S. Margel, A. Gedanken, T. C. Rojas, A. Fernández and R. Prozorov
DOI: http://dx.doi.org/10.1557/JMR.1999.0530 (About DOI)
Yeshwanth Narendar and Gary L. Messing
DOI: http://dx.doi.org/10.1557/JMR.1999.0531 (About DOI)
S. Vargas, R. Arroyo, E. Haro and R. Rodríguez
DOI: http://dx.doi.org/10.1557/JMR.1999.0532 (About DOI)
P. P. Ahonen, E. I. Kauppinen, J. C. Joubert, J. L. Deschanvres and G. Van Tendeloo
DOI: http://dx.doi.org/10.1557/JMR.1999.0533 (About DOI)
Yung-Jen Lin and Lee-Jen Chen
DOI: http://dx.doi.org/10.1557/JMR.1999.0534 (About DOI)
T. K. Kundu and D. Chakravorty
DOI: http://dx.doi.org/10.1557/JMR.1999.0535 (About DOI)
K. F. Chan, C. W. Ong, C. L. Choy and R. W. M. Kwok
DOI: http://dx.doi.org/10.1557/JMR.1999.0536 (About DOI)
K. Sangwal, P. Gorostiza, J. Servat and F. Sanz
DOI: http://dx.doi.org/10.1557/JMR.1999.0537 (About DOI)
Yuanzheng Yue, Ralf Keding and Christian Rüssel
DOI: http://dx.doi.org/10.1557/JMR.1999.0538 (About DOI)
Jung-Hyun Lee and Shi-Woo Rhee
DOI: http://dx.doi.org/10.1557/JMR.1999.0539 (About DOI)
Weng Sing Beh, Younan Xia and Dong Qin
DOI: http://dx.doi.org/10.1557/JMR.1999.0540 (About DOI)
J. H. Kim and F. F. Lange
DOI: http://dx.doi.org/10.1557/JMR.1999.0541 (About DOI)
G. Rong, N. Newman, B. Shaw and D. Cronin
DOI: http://dx.doi.org/10.1557/JMR.1999.0542 (About DOI)
G. S. Grader, Y. de Hazan, G. Natali, T. Dadosh and G. E. Shter
DOI: http://dx.doi.org/10.1557/JMR.1999.0543 (About DOI)
M. Menezes, I. M. Robertson and H. K. Birnbaum
DOI: http://dx.doi.org/10.1557/JMR.1999.0544 (About DOI)
Qiheng Tang and Tzuchiang Wang
DOI: http://dx.doi.org/10.1557/JMR.1999.0545 (About DOI)
Shogo Komura, Zenji Horita, Minoru Nemoto and Terence G. Langdon
DOI: http://dx.doi.org/10.1557/JMR.1999.0546 (About DOI)
Zhenqiang Ma and Gary S. Was
DOI: http://dx.doi.org/10.1557/JMR.1999.0547 (About DOI)
L. Liu, T. J. Zhang, K. Cui and Y. D. Dong
DOI: http://dx.doi.org/10.1557/JMR.1999.0548 (About DOI)
Sun-Ho Kang, Han-Ill Yoo and Hyun Min Park
DOI: http://dx.doi.org/10.1557/JMR.1999.0549 (About DOI)
S. Shimizu, T. Yanagimoto and M. Sakai
DOI: http://dx.doi.org/10.1557/JMR.1999.0550 (About DOI)
C. Kylner and L. Mattsson
DOI: http://dx.doi.org/10.1557/JMR.1999.0551 (About DOI)
Patric Mikhail, Reto Basler and Jürg Hulliger
DOI: http://dx.doi.org/10.1557/JMR.1999.0552 (About DOI)
Ce Wang, Yahong Zhang, Yunfeng Lu and Yen Wei
DOI: http://dx.doi.org/10.1557/JMR.1999.0553 (About DOI)
Arthur C. M. Chong and David C. C. Lam
DOI: http://dx.doi.org/10.1557/JMR.1999.0554 (About DOI)
Wei-Lung Wang, J. R. Chen and Sanboh Lee
DOI: http://dx.doi.org/10.1557/JMR.1999.0555 (About DOI)