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Efficient Luminescence from {11.2} InGaN/GaN Quantum Wells

Published online by Cambridge University Press:  01 February 2011

Mitsuru Funato ,
Koji Nishizuka ,
Yoichi Kawakami ,
Yukio Narukawa  and
Takashi Mukai
Mitsuru Funato
Affiliation:
Kyoto University, Department of Electronic Science and Engineering, Kyoto 615–8510, Japan
Koji Nishizuka
Affiliation:
Kyoto University, Department of Electronic Science and Engineering, Kyoto 615–8510, Japan
Yoichi Kawakami
Affiliation:
Kyoto University, Department of Electronic Science and Engineering, Kyoto 615–8510, Japan
Yukio Narukawa
Affiliation:
Nitride Semiconductor Research Laboratory, Nichia Corporation, Tokushima 774–8601, Japan
Takashi Mukai
Affiliation:
Nitride Semiconductor Research Laboratory, Nichia Corporation, Tokushima 774–8601, Japan
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Abstract

InGaN/GaN multiple quantum wells (MQWs) with [0001], <11.2>, and <11.0> orientations have been fabricated by means of the re-growth technique on patterned GaN templates with striped geometry, normal planes of which are (0001) and {11.0}, on sapphire (0001) substrates. It was found that photoluminescence intensity of the {11.2} QW is the strongest among the three QWs, and its internal quantum efficiency was estimated to be as large as about 40% at room temperature. The radiative recombination lifetime of the {11.2} QW was about 0.39 ns at 14 K, which was 3.8 times shorter than that of conventional c-oriented QWs emitting at a similar wavelength. These findings are well explained by the high internal quantum efficiency in the {11.2} QW owing to the suppression of piezoelectric fields.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 831: Symposium E – GaN, AlN, InN, and Their Alloys , 2004 , E5.5
Copyright
Copyright © Materials Research Society 2005

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References

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