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Initial stages of silicate growth on and oxidation of graphite: A model for composites

Published online by Cambridge University Press:  31 January 2011

Dawn A. Bonnell
Affiliation:
Department of Materials Science and Engineering, The University of Pennsylvania, Philadelphia, Pennsylvania 19104
Darrin Jiron
Affiliation:
Department of Materials Science and Engineering, The University of Pennsylvania, Philadelphia, Pennsylvania 19104
Timothy Flinn
Affiliation:
Department of Materials Science and Engineering, The University of Pennsylvania, Philadelphia, Pennsylvania 19104
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Extract

The initial stages of silicate growth on graphite are characterized with atomic force microscopy. The morphological development indicates that decomposition of tetra ethyloxysilane at low pressure produces films of 3 nm clusters located at undercoordinated carbon sites. Clusters eventually cover the surface, at which point a second layer grows. In higher pressure deposition multiple layers of clusters grow simultaneously. A comparison of the oxidation behavior of surfaces with defects completely and incompletely terminated with SiOx shows that edge recession is the primary oxidation mechanism and that the site specificity of SiOx is effective in inhibiting oxidation.

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Articles
Copyright
Copyright © Materials Research Society 1998

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