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Physical Properties of Hafnium-Silicate Transistor Gate Dielectric Stacks after Thermal Processing

Published online by Cambridge University Press:  01 August 2005

B Foran ,
M Campin ,
M Clark ,
G Lian ,
C Johnson ,
G Bersuker ,
P Lysaght  and
R Rhoad
B Foran
Affiliation:
ATDF, Austin, Texas
M Campin
Affiliation:
ATDF, Austin, Texas
M Clark
Affiliation:
ATDF, Austin, Texas
G Lian
Affiliation:
ATDF, Austin, Texas
C Johnson
Affiliation:
ATDF, Austin, Texas
G Bersuker
Affiliation:
SEMATECH, Austin, Texas
P Lysaght
Affiliation:
SEMATECH, Austin, Texas
R Rhoad
Affiliation:
ATDF, Austin, Texas

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 2082 - 2083
Copyright
© 2005 Microscopy Society of America