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Nanopillar Fabrication with Focused Ion Beam Cutting

Published online by Cambridge University Press:  04 July 2014

Oleksii V. Kuzmin ,
Yutao T. Pei  and
Jeff T.M. De Hosson
Oleksii V. Kuzmin
Affiliation:
Materials Innovation Institute (M2i), Department of Applied Physics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
Yutao T. Pei*
Affiliation:
Materials Innovation Institute (M2i), Department of Applied Physics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
Jeff T.M. De Hosson
Affiliation:
Materials Innovation Institute (M2i), Department of Applied Physics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
*
*Corresponding author. y.pei@rug.nl
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Abstract

A versatile method to fabricate taper-free micro-/nanopillars of large aspect ratio was developed with focused ion beam (FIB) cutting. The key features of the fabrication are a FIB with an incident angle of 90° to the long axis of the pillar that enables milling of the pillar sideways avoiding tapering and the FIB current can be reduced step by step so as to reduce possible radiation damage of the milled surface by Ga ions. A procedure to accurately determine the cross-section of each pillar was developed.

Keywords

nanopillarsfocused ion beammetallic glassTEM
Type
Instrumentation and Techniques Development
Information
Microscopy and Microanalysis , Volume 20 , Issue 5 , October 2014 , pp. 1581 - 1584
Copyright
© Microscopy Society of America 2014 

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