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Resistive Switching Behavior and Electrical Properties of TiO2:Ho2O3 and HoTiOx Based MIM Capacitors

Published online by Cambridge University Press:  17 June 2014

H. García
Affiliation:
Dpto. Electricidad y Electrónica, E.T.S.I.Telecomunicación, University of Valladolid, 47011 Valladolid, Spain.
H. Castán
Affiliation:
Dpto. Electricidad y Electrónica, E.T.S.I.Telecomunicación, University of Valladolid, 47011 Valladolid, Spain.
S. Dueñas
Affiliation:
Dpto. Electricidad y Electrónica, E.T.S.I.Telecomunicación, University of Valladolid, 47011 Valladolid, Spain.
E. Pérez
Affiliation:
Dpto. Electricidad y Electrónica, E.T.S.I.Telecomunicación, University of Valladolid, 47011 Valladolid, Spain.
L. A. Bailón
Affiliation:
Dpto. Electricidad y Electrónica, E.T.S.I.Telecomunicación, University of Valladolid, 47011 Valladolid, Spain.
K. Kukli
Affiliation:
Department of Chemistry, University of Helsinki, FI-00014 Helsinki, Finland. Institute of Physics, Department of Materials Science, University of Tartu, EE-51014 Tartu, Estonia.
M. Ritala
Affiliation:
Department of Chemistry, University of Helsinki, FI-00014 Helsinki, Finland.
M. Leskelä
Affiliation:
Department of Chemistry, University of Helsinki, FI-00014 Helsinki, Finland.
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Abstract

Ho2O3-TiO2 based metal-insulator-metal capacitors were grown by ALD, using Ho(thd)3, Ti(OCH(CH3)2)4 and ozone as precursors. The thicknesses of the films were in the range of 7.7 to 25 nm. Some of the films were post-deposited annealed in order to study the treatment effects. The capacitors were electrically characterized. Leakage current decreases as the amount of holmium increased in the films. Resistive switching behavior was obtained in the samples where the leakage current was low. This effect was also observed in Ho2O3 films, where no titanium was present in the films.

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Articles
Copyright
Copyright © Materials Research Society 2014 

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