Hostname: page-component-8448b6f56d-tj2md Total loading time: 0 Render date: 2024-04-20T01:32:05.931Z Has data issue: false hasContentIssue false

Size-controlled deposition of Ag and Si nanoparticle structures with gas-aggregated sputtering

Published online by Cambridge University Press:  21 May 2013

Cathal Cassidy
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Vidyadhar Singh
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Zafer Hawash
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Murtaza Bohra
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Jeong-Hwan Kim
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Mukhles Sowwan
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Get access

Abstract

Physical vapor deposition, in combination with gas-aggregation (PVD-GA), is a controllable method for creation of diverse nanoparticle structures. Given the size effects that dominate the physics of nanoparticles, a particular advantage of the PVD-GA technique is the compatibility with in situ mass filtering of the nanocluster beam.

In the current work, PVD-GA has been utilized to deposit Ag and Si nanoparticles. Nanoparticles were analyzed using in situ quadrupole mass spectrometry (charge/mass ratio), atomic force microscopy (nanoparticle height), and transmission electron microscopy (nanocluster diameter & crystallinity). The results for particle size distribution were cross-correlated, with excellent agreement.

Different growth methods & conditions were explored, resulting in controlled differences in the measured particle size distributions and surface coverage. A novel growth configuration utilizing a conventional sputter source in combination with a linear magnetron allowed a significant (fivefold) increase in Ag cluster yield.

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Lee, K.C. et al. , Surface Coatings and Technology 202 (2008) 53395342.CrossRefGoogle Scholar
Park, N.M. et al. , Appl. Phys. Lett., Vol. 78, No. 17 (2001) 25742577.Google Scholar
Enriquez, H. et al. , J. Phys.: Condens. Matter 24 (2012) 314211.Google Scholar
Haberland, H. et al. ., J. Vac. Sci. Technol. A 12(5), 1994, 29252930.CrossRefGoogle Scholar
Stranak, V. et al. , Surface Coatings and Technology 205 (2011) 27552762.CrossRefGoogle Scholar
Gracia-Pinilla, M. et al. , Nanoscale Res Lett (2010) 5:180188.CrossRefGoogle Scholar
Nielsen, R.M. et al. , J Nanopart Res (2010) 12:12491262.CrossRefGoogle Scholar
Miller, E.M. et al. , Journal of Chemical Education, Volume 63 Issue 7 pp617622, 1986.CrossRefGoogle Scholar
Ganeva, M., et al. ., Contrib. Plasma Phys., 110 (2012).Google Scholar
Rasband, W., ImageJ Version 1.47c, National Institute for Health, USA, http://imagej.nih.gov/ij.Google Scholar
Lacava, L.M. et al. , J. Magn. Magn. Mater 225 (2001) 7983.CrossRefGoogle Scholar
Polonskyi, O. et al. , Thin Solid Films 520 (2012) 41554162.CrossRefGoogle Scholar