MRS Proceedings


Electroplate-and-Lift (E&L) Lithography on Reusable, Patterned Ultrananocrystalline Diamond (UNCD) Templates for Rapid Prototyping of Micro- and Nanowires.

2011 MRS Fall Meeting.

Dylan Jonesa1*, Lori A. Lepaka1, Anirudha V. Sumanta2, Ralu Divana2, Orlando Aucielloa3, David B. Seleya1, Daniel A. Dissinga1*, Suzanne Millera2, Daniel Rosenmanna2, Ephriam Danielsa1*, Ruth Gervaisa1* and Michael P. Zacha1

a1 Dept. of Chemistry, University of Wisconsin – Stevens Point, Stevens Point, WI 54481, USA

a2 Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL 60439, USA

a3 Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA


As device sizes are scaled down nearly to their atomic limits, the development of economically viable methods which may continue to improve device performance in accordance with Moore’s Law becomes ever more challenging. The recently developed technique of Electroplate-and-Lift (E&L) lithography promises to be an inexpensive, widely applicable method for the reproducible, controlled fabrication of micro- and nanostructures. In this study, E&L is applied to the fabrication of patterned copper micro- and nanowires as a model system. Copper wires with diameters ranging from 10 m to 200 nm have been produced using a single ultrananocrystalline diamond (UNCD)TM template, by varying only the electroplating time.

To quantify the relationship between copper wire diameter and deposition time, wires were electroplated at -0.4 V vs. the saturated calomel electrode (SCE) for durations between 2.5 and 160 s, then imaged by optical microscopy and/or scanning electron microscopy (SEM). Images were analyzed by identifying wire segments with ImageJ and examining the statistical distribution of wire diameters using Excel. This analysis verified theoretical predictions of a linear dependence between mean wire diameter and the square root of growth time.

(Online publication March 30 2012)

Key Words:

  • lithography (deposition);
  • nanostructure;
  • electrodeposition


* denotes undergraduate student