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Surface irradiation and materials processing using polyatomic cluster ion beams

Published online by Cambridge University Press:  12 January 2012

Gikan H. Takaoka ,
Hiromichi Ryuto  and
Mitsuaki Takeuchi
Gikan H. Takaoka*
Affiliation:
Photonics and Electronics Science and Engineering Center, Kyoto University, Katsura, Kyoto 615-8510, Japan
Hiromichi Ryuto
Affiliation:
Photonics and Electronics Science and Engineering Center, Kyoto University, Katsura, Kyoto 615-8510, Japan
Mitsuaki Takeuchi
Affiliation:
Photonics and Electronics Science and Engineering Center, Kyoto University, Katsura, Kyoto 615-8510, Japan
*
a)Address all correspondence to this author. e-mail: gtakaoka@kuee.kyoto-u.ac.jp
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Abstract

We developed a polyatomic cluster ion beam system for materials processing, and polyatomic clusters of materials such as alcohol and water were produced by an adiabatic expansion phenomenon. In this article, cluster formation is discussed using thermodynamics and fluid dynamics. To investigate the interactions of polyatomic cluster ions with solid surfaces, various kinds of substrates such as Si(100), SiO2, mica, polymethyl methacrylate, and metals were irradiated by ethanol, methanol, and water cluster ion beams. To be specific, chemical reactions between radicals of polyatomic molecules and surface Si atoms were investigated, and low-irradiation damage as well as high-rate sputtering was carried out on the Si(100) surfaces. Furthermore, materials processing methods including high-rate sputtering, surface modification, and micropatterning were demonstrated with ethanol and water cluster ion beams.

Keywords

Surface reactionIon beam processingIon-solid interactions
Type
Articles
Information
Journal of Materials Research , Volume 27 , Issue 5: Focus Issue: Plasma and Ion-Beam Assisted Materials Processing , 14 March 2012 , pp. 806 - 821
Copyright
Copyright © Materials Research Society 2011

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