Journal of Materials Research

Articles

Surface irradiation and materials processing using polyatomic cluster ion beams

Gikan H. Takaokaa1 c1, Hiromichi Ryutoa1 and Mitsuaki Takeuchia1

a1 Photonics and Electronics Science and Engineering Center, Kyoto University, Katsura, Kyoto 615-8510, Japan

Abstract

We developed a polyatomic cluster ion beam system for materials processing, and polyatomic clusters of materials such as alcohol and water were produced by an adiabatic expansion phenomenon. In this article, cluster formation is discussed using thermodynamics and fluid dynamics. To investigate the interactions of polyatomic cluster ions with solid surfaces, various kinds of substrates such as Si(100), SiO2, mica, polymethyl methacrylate, and metals were irradiated by ethanol, methanol, and water cluster ion beams. To be specific, chemical reactions between radicals of polyatomic molecules and surface Si atoms were investigated, and low-irradiation damage as well as high-rate sputtering was carried out on the Si(100) surfaces. Furthermore, materials processing methods including high-rate sputtering, surface modification, and micropatterning were demonstrated with ethanol and water cluster ion beams.

(Received August 10 2011)

(Accepted November 11 2011)

(Online publication January 12 2012)

Key Words:

  • Surface reaction;
  • Ion beam processing;
  • Ion-solid interactions

Correspondence:

c1 Address all correspondence to this author. e-mail: gtakaoka@kuee.kyoto-u.ac.jp

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