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Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films

Published online by Cambridge University Press:  20 December 2011

Adolfo Mosquera ,
David Horwat ,
Luis Vazquez ,
Alejandro Gutiérrez ,
Alexei Erko ,
André Anders ,
Joakim Andersson  and
Jose L. Endrino
Adolfo Mosquera
Affiliation:
Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, E-28049 Madrid, Spain
David Horwat
Affiliation:
Institut Jean Lamour, Ecole des Mines de Nancy, 54042 Nancy, France
Luis Vazquez
Affiliation:
Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, E-28049 Madrid, Spain
Alejandro Gutiérrez
Affiliation:
Departamento de Física Aplicada and Instituto Nicolás Cabrera, Universidad Autónoma de Madrid, E-28049 Madrid, Spain
Alexei Erko
Affiliation:
Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Elektronenspeicherring BESSY II, 12489 Berlin, Germany
André Anders
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720
Joakim Andersson
Affiliation:
The Angstrom Laboratory, Uppsala University, S-75121 Uppsala, Sweden
Jose L. Endrino*
Affiliation:
Abengoa Research, Campus Palmas Altas, E-41014 Sevilla, Spain
*
a)Address all correspondence to this author. e-mail: jose.endrino@research.abengoa.com
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Abstract

Porous platinum thin films were prepared by thermal decomposition at temperatures from 25 to 675 °C of platinum oxide films deposited by a pulsed reactive sputtering technique. The samples’ chemistry and structure were investigated by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and x-ray absorption near edge structure (XANES), showing that the decomposition of the oxide begins as low as 400 °C and follows a sigmoidal trend with increasing annealing temperature. In the XRD spectra, only an amorphous-like signature was observed for temperatures below 575 °C, while Pt 4f XPS showed that the deposited oxide was a mixture of PtO2 and PtO. Pt-L3 edge XANES and Pt 4f XPS spectra showed that the Pt concentration and electronic structure are predominant for temperatures equal to or above 575 °C. The morphologies of the films were investigated by the area-perimeter method from atomic force microscopy and scanning electron microscopy (SEM) images, indicating that the surfaces exhibit a combination of Euclidian and fractal characteristics. Moreover, the thermal evolution of these characteristics indicates the agglomeration of the grains in the film as observed by SEM.

Keywords

AnnealingPtBonding
Type
Articles
Information
Journal of Materials Research , Volume 27 , Issue 5: Focus Issue: Plasma and Ion-Beam Assisted Materials Processing , 14 March 2012 , pp. 829 - 836
Copyright
Copyright © Materials Research Society 2011

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