a1 School of Mechanical Engineering, Tianjin University, Tianjin 300072, China
a2 School of Mechanical Engineering, Hebei University of Technology, Tianjin 300130, China
In this paper a 3-degree of freedom compliant parallel positioning stage utilizing flexure hinges is explored for nanoimprint lithography. The performance of the stage is extensively analyzed using a pseudo-rigid body model and finite element method. The position and velocity models are established. Accordingly, the stiffness at driving point of the active arm is obtained on the basis of Castigliano's first theorem. The system stiffness of the compliant stage is explored using the compliant matrix methodology and matrix transformation, and the influence of the geometry parameters on stiffness factors in three directions has been graphically evaluated as well. Finite element analysis has been conducted to verify that the established models faithfully predict device performance.
(Accepted September 29 2011)
(Online publication November 14 2011)