MRS Proceedings

Table of Contents - Volume  622  - Symposium T – Wide-Bandgap Electronic Devices  

Editors : M. Murakami, W. Pletschen, F. Ren, R.J. Shul


Lattice Parameters and Thermal Expansion of Important Semiconductors and Their Substrates

2000 MRS Spring Meeting.

Robert R. Reebera1 and Kai Wanga1

a1 Department of Materials Science and Engineering, North Carolina State University Raleigh, NC 27695-7907


Thermal expansion and lattice parameters are useful thermophysical properties of materials. A knowledge of their temperature dependence is essential for optimizing device design and crystal growth conditions while minimizing the residual stress in epitaxial films and electronic devices. Currently first principles theory can predict lattice parameters to 0.01%. Information required for device design and thin film crystal growth requires improvements two to three orders of magnitude better than this. Available experimental results from our work and the literature will be reviewed in terms of a high temperature predictive model. Tables of thermal expansion and lattice parameters for AlN, GaN, 6H-SiC, β-SiC, MgO, Al2O3, ZnO and GaAs are provided.