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MeV Ion Implantation in Electronic Materials*

Published online by Cambridge University Press:  25 February 2011

T. A. Todurello
T. A. Todurello*
Affiliation:
Division of Physics, Mathematics, and Astronomy, California Institute of Technology, Pasadena, CA 91125
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Abstract

Using MeV ions for the modification of electronic materials offers a number of advantages: minimizing surface damage; implantation into completed devices – for example, through contacts or photoresist layers; producing controlled radiation damage for flux pinning where the ions pass completely through the sample and thus do not modify its chemical nature; and enhancing the electronic excitation of the target material versus collisional damage, as in adhesion enhancement processes. In all cases, however, one requires a detailed understanding of the new damage mechanisms that occur and how they can be modified in a controlled way by annealing. In this report I shall present examples from a number of our experiments: resistivity and index of refraction modification in semiconductors; adhesion enhancement; mixing of multilayer structures; and modification of the electronic properties of insulators and superconductors.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 268: Symposium K – Materials Modification by Energetic Atoms and Ions , 1992 , 273
Copyright
Copyright © Materials Research Society 1992

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Footnotes

*

Supported in part by the National Science Foundation [Grant DMR90-11230]

References

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