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Dielectric Properties of Pulsed Excimer Laser Ablated BaBi2Nb2O9 Thin Films

Published online by Cambridge University Press:  11 February 2011

Apurba Laha
Affiliation:
Materials Research Center, Indian Institute of Science, Bangalore 560 012, INDIA
S. B. Krupanidhi
Affiliation:
Materials Research Center, Indian Institute of Science, Bangalore 560 012, INDIA
S. Saha
Affiliation:
Materials Science Divisions, Argonne National Laboratory, 9700, S. Cass Avenue, Argonne, IL-60439, USA
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Abstract

The dielectric response of BaBi2Nb2O9 (BBN) thin films has been studied as a function of frequency over a wide range of temperatures. Both dielectric constant and loss tangent of BBN thin films showed a ‘power law’ dependence with frequency, which was analyzed using the Jonscher's universal dielectric response model. Theoretical fits were utilized to compare the experimental results and also to estimate the value of temperature dependence parameters such as n(T) and a(T) used in the Jonscher's model. The room temperature dielectric constant (ε') of the BBN thin films was 214 with a loss tangent (tanδ) of 0.04 at a frequency of 100 kHz. The films exhibited the second order dielectric phase transition from ferroelectric to paraelectric state at a temperature of 220 °C. The nature of phase transition was confirmed from the temperature dependence of dielectric constant and sponteneous polarization,respectively. The calculated Currie constant for BBN thin films was 4 × 105°C.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCE

1. De Araujo, C. A. Paz., Cuchiaro, J. D., Scott, M. C., McMillan, L. D., and Scott, J. F., Nature (London) 374, 627 (1995).Google Scholar
2. Paz de Araujo, C. A., McMillan, L. D., Melnick, B. M., Cuchiaro, J. D., and Scott, J. F., Ferroelectrics, 104, 241 (1990).Google Scholar
3. Otsuki, T. and Arita, K., Integr. Ferroelectr., 17, 31 (1997).Google Scholar
4. Song, T. K., Lee, J. -K., and Jung, H. J., Appl. Phys. Lett., 69, 3839 (1996).Google Scholar
5. Bhattacharyya, S., Bharadwaja, S. S. N., and Krupanidhi, S. B., Appl. Phys. Lett. 75, 2656 (1999).Google Scholar
6. Desu, S. B. and Li, T., Mat. Sci. Eng., B34, L4 (1995).Google Scholar
7. Lu, C. H. and Wen, C. Y., J. Appl. Phys. 86, 6335 (1999).Google Scholar
8. Laha, A. and Krupanidhi, S. B., Appl. Phys. Lett. 77, 3818 (2000).Google Scholar
9. Warren, W. L., Dimos, D., Tuttle, B. A., Nasby, R. D., and Pike, D. E., Appl. Phys. Lett. 65, 1018 (1994).Google Scholar
10. Mihara, T., Yoshimori, H., Watanabe, H., and Paz de Araujo, C. A., Jpn. J. Appl. Phys., 34, 5233 (1995).Google Scholar
11. Subbarao, E. C., Phys. Chem. Solids, 23, 665 (1962).Google Scholar
12. Jonscher, A. K., Dielectric Relaxation in Solids, Chelsea Dielectrics Press, London (1983).Google Scholar