Table of Contents - Volume 537 - Symposium G – GaN and Related Alloys
Editors : C. Kuo, S.J. Pearton, T. Uenoyama, A.F. Wright
a1 Dept. of Physics, Boston University, Boston, MA, 02215, gbunea@bu.edu
a2 Dept. of Electrical and Computer Engineering, Boston University, Boston, MA, 02215
Abstract
Static induction transistors (SITs) are short channel FET structures which are suitable for high power, high frequency and high temperature applications. GaN has particularly favorable properties for SIT operation. However, such a device has not yet been fabricated. In this paper we report simulation studies on GaN static induction transistors over a range of device structures and operating conditions. The transistor was modeled with coupled drift-diffusion and heat-flow equations. We found that the performance of the device depends sensitively on the thermal boundary conditions, as self-heating effects limit the maximum voltage swing.