a1 Department of Applied Physics, National Technical University of Athens, 15780 Zografou, Greece
a2 Institute of Materials Science, NCSR Demokritos, 15310 Aghia Paraskevi, Greece
a3 Department of Applied Physics, National Technical University of Athens, 15780 Zografou, Greece; and Institute of Microelectronics, NCSR Demokritos, 15310 Aghia Paraskevi, Greece
A novel nanoparticle self-assembly process is demonstrated. Nanoparticles were fabricated by a DC magnetron sputtering process. A silicon substrate was initially patterned with arrays of peak and valley photoresist structures using inexpensive patterning techniques. When the nanoparticles were deposited onto the prepatterned substrate, due to surface topography induced local increase in the electric field created by the charges on the nanoparticles, the nanoparticles were self-assembled onto the peaks of the structures and formed long nanowire arrays.
(Received May 02 2010)
(Accepted July 14 2010)
(Online publication January 24 2011)