MRS Proceedings

Table of Contents - Volume  947  - Symposium A – Responsive Soft Matter – Chemistry and Physics for Assemblages, Films and Forms  

Editors : R. A. Vaia, J. Genzer, G.H. McKinley, N. Tabiryan

Articles

A General Approach to Patterning Micron-Scale Particles

2006 MRS Fall Meeting.

Nathanael Sieba1 and Byron D. Gatesa2

a1 nsieb@sfu.ca, Simon Fraser University, Department of Chemistry, 8888 University Drive, Burnaby, V5A1S6, Canada

a2 bgates@sfu.ca, Simon Fraser University, Department of Chemistry, 8888 University Drive, Burnaby, V5A1S6, Canada

ABSTRACT

Multiple techniques have been developed to assemble micro- or nanostructured materials into well-defined patterns. These techniques are, however, often dependent on the size, shape, composition and/or surface chemistry of the structures being patterned. We have developed a general approach to pattern materials with a wide range of physical and chemical characteristics. We are able to assemble these materials into isolated or interconnected patterns covering areas up to ∼1 mm2.

(Received November 21 2006)

(Accepted December 18 2006)

Key Words

  • self-assembly;
  • microstructure;
  • colloid
0Comments
Related Content