Hostname: page-component-8448b6f56d-t5pn6 Total loading time: 0 Render date: 2024-04-18T18:01:00.562Z Has data issue: false hasContentIssue false

Applications and Processing of Transparent Conducting Oxides

Published online by Cambridge University Press:  31 January 2011

Get access

Extract

The first report of a transparent conducting oxide (TCO) was published in 1907, when Badeker reported that thin films of Cd metal deposited in a glow discharge chamber could be oxidized to become transparent while remaining electrically conducting. Since then, the commercial value of these thin films has been recognized, and the list of potential TCO materials has expanded to include, for example, Al-doped ZnO, GdInOx, SnO2, F-doped In2O3, and many others. Since the 1960s, the most widely used TCO for optoelectronic device applications has been tin-doped indium oxide (ITO). At present, and likely well into the future, this material offers the best available performance in terms of conductivity and transmissivity, combined with excellent environmental stability, reproducibility, and good surface morphology. The use of other TCOs in large quantities is application-specific. For example, tin oxide is now widely used in architectural glass applications.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Badeker, K., Ann. Phys. (Leipzig) 22 (1907) p. 749.CrossRefGoogle Scholar
2.Hamberg, I. and Granqvist, C.G., J. Appl. Phys. 60 (11) (1986) p. R123.CrossRefGoogle Scholar
3.Song, P.K., Jpn. J. Appl. Phys., Part 1 37 (4A) (1998) p. 1870.CrossRefGoogle Scholar
4.Paine, D.C., Whitson, T., Janiac, D., Beresford, R., Ow-Yang, C.W., and Lewis, B., J. Appl. Phys. 85 (12) (1999) p. 8445.CrossRefGoogle Scholar
5.Cornia, R.L., Fenn, J.B., Memarian, H., and Ringer, R., Proc. 41st Annu. Tech. Conf. (Society of Vacuum Coaters, Boston, 1998) p. 452.Google Scholar
6.Flat Panel Display Hotline 6 (6) (June 1997) p. 7.Google Scholar
7.Schlott, M., Kutzner, M., Gehman, B.L., Reger, N., and Stadermann, F.J., SID Digest of Tech. Papers 27 (1996) p. 522.Google Scholar
8.Lewis, B.G., Mohanty, R., and Paine, D.C., in Proc. 37th Annu. Tech. Conf. (Society of Vacuum Coaters, Albuquerque, NM, 1994) p. 432.Google Scholar
9.Gehman, B.L., Jonsson, S., Rudolph, T., Scherer, M., Weigert, M., and Werner, R., Thin Solid Films 220 (1992) p. 333.CrossRefGoogle Scholar
10.Nishimura, E., Ando, M., Onisawa, K., Takabatake, M., and Minemura, T., Jpn. J. Appl. Phys., Part 1 35 (5A) (1996) p. 2788.CrossRefGoogle Scholar
11.Ow-Yang, C.W., Shigesato, Y., and Paine, D.C., J. Appl. Phys. (2000) in press.Google Scholar
12.Barber, R., Pryor, G., and Reinheimer, E., SID Digest of Tech. Papers 28 (1997) p. 18.Google Scholar
13.Saito, T., Kanna, K., Inoue, T., and Morikawa, S., SID Digest of Tech. Papers 26 (1995) p. 28.Google Scholar
14.Xirouhaki, C., Kiriakidis, G., and Fritzsche, H., J. Appl. Phys. 79 (12) (1996) p. 9349.CrossRefGoogle Scholar
15.Pissadakis, S., Mailis, S., Reekie, S.L., Wilkinson, J.S., Eason, R.W., Vainos, N.A., Moschovis, K., and Kiriakidis, G., Appl. Phys. A 69 (3) (1999) p. 333.CrossRefGoogle Scholar
16.Mailis, S., Boutsikaris, L., Vainos, N.A., Xirouhaki, C., Vasiliou, G., Garawal, N., Kiriakidis, G., and Fritzsche, H., Appl. Phys. Lett. 69 (1996) p. 2459.CrossRefGoogle Scholar
17.Grivas, C., Mailis, S., Boutsikaris, L., Gill, D.S., Vainos, N.A., and Chandler, P.J., Laser Phys. 8 (1) (1998) p. 326.Google Scholar
18.Moschovis, K., Gagaoudakis, E., Chatzitheodoridis, E., Kiriakidis, G., Mailis, S., Tzamali, E., Vainos, N.A., and Fritzsche, H., Appl. Phys. A 66 (1998) p. 651.CrossRefGoogle Scholar
19.Cairns, D.R., Witte, R.P., Sparacin, D.K., Sachsman, S.M., Paine, D.C., Crawford, G.P., and Newton, R.Appl. Phys. Lett. 76 (11) (2000) p. 1425.CrossRefGoogle Scholar