Technical Feature

Infrared Vertical-Cavity Surface-Emitting Lasers: An Industrial Perspective

David W. Kisker and Jeff E. Bisberg

Abstract

Optical components based on vertical-cavity surface-emitting lasers (VCSELs) are moving from 850-nm wavelengths to 1.31-μm and 1.55-μm wavelengths. These long-wavelength devices, enabled by new developments in materials technology, will compete directly with distributed-feedback (DFB) and Fabry-Pérot (FP) laser technologies in fiber-optic markets. In addition, the unique properties of VCSELs are opening up a new category of optically integrated components that are not possible with traditional edge-emitting laser source technologies. These VCSEL structures, such as linear and two-dimensional arrays, have the potential to dramatically reduce the cost structure of traditional optical networking equipment and provide a path for rapid growth in optical bandwidth.

Keywords

• compound semiconductors;
• electro-optic materials;
• molecular-beam epitaxy (MBE);
• vertical-cavity surface-emitting lasers (VCSELs).

David W. Kisker is the vice president of VCSEL Technology Development at Cielo Communications Inc. in Broomfield, Colo. After receiving his PhD degree from Stanford University in materials science in 1981, Kisker worked as a postdoctoral scientist at the Max Planck Institute for Solid-State Research, where he studied the optical properties of III–V materials. From 1983 until 1990, he was a member of the technical staff at AT&T Bell Laboratories and was then a research staff member at the IBM T.J. Watson Research Center until 1998, when he joined Cielo.

Kisker's research has included a broad range of compound-semiconductor materials development activities, including II–VI and III–V compounds. He has also performed extensive fundamental studies related to chemical vapor deposition using in situ synchrotron-based x-ray scattering methods. This work, performed on growing GaAs surfaces, established the presence of surface reconstructions during CVD, leading to insights regarding the mechanism of the growth process. After joining Cielo, he led a team that collaborated with Sandia National Laboratories to develop 1310-nm VCSELs and later transferred the technology to the company's factory. He is a co-author of more than 75 publications as well as numerous conference presentations, and is a fellow of the American Physical Society.

Kisker can be reached by e-mail at dkisker@cieloinc.com.

Jeff E. Bisberg's research has focused mainly on laser fabrication and optical system integration for laser-based high-resolution printing systems. He received his MS degree in materials science and engineering from Northwestern University, where he was also president of the TMS/MRS chapter, and then received a BS degree in chemical engineering from the University of Rochester.