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Growth of diamond thin films by microwave plasma chemical vapor deposition process

Published online by Cambridge University Press:  31 January 2011

H. C. Barshilia ,
B. R. Mehta  and
V. D. Vankar
H. C. Barshilia
Affiliation:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology, New Delhi-110 016, India
B. R. Mehta
Affiliation:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology, New Delhi-110 016, India
V. D. Vankar
Affiliation:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology, New Delhi-110 016, India
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Abstract

A very high vacuum compatible microwave plasma chemical vapor deposition system has been fabricated for the growth of diamond thin films. Microcrystalline diamond thin films have been grown on silicon substrates from the CH4−H2 gas mixture. Scanning electron microscopy and x-ray diffraction have been used to study the surface morphology and the crystallographic structure of the films. Optical emission spectroscopy has been used for the detection of chemical species present in the plasma. The strong dependence of the film microstructure on the intensity of CH emission line has been observed.

Type
Articles
Information
Journal of Materials Research , Volume 11 , Issue 4 , April 1996 , pp. 1019 - 1024
Copyright
Copyright © Materials Research Society 1996

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