Applications of High-Resolution Aberration-Corrected STEM Imaging to Studies of the Behavior of Nanophase Materials at Elevated Temperatures

LF Allard; KL More; J Liu

doi:10.1017/S143192760909895X

Applications of High-Resolution Aberration-Corrected STEM Imaging to Studies of the Behavior of Nanophase Materials at Elevated Temperatures

Published online by Cambridge University Press: 26 July 2009

LF Allard ,

KL More and

J Liu

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LF Allard: Affiliation:
Oak Ridge National Laboratory
KL More: Affiliation:
Oak Ridge National Laboratory
J Liu: Affiliation:
University of Missouri-St Louis

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Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009

Type: Abstract
Information: Microscopy and Microanalysis , Volume 15 , Supplement S2 , July 2009 , pp. 130 - 131

DOI: https://doi.org/10.1017/S143192760909895X [Opens in a new window]

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Applications of High-Resolution Aberration-Corrected STEM Imaging to Studies of the Behavior of Nanophase Materials at Elevated Temperatures

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