Microscopy and Microanalysis


Special Issue: Frontiers of Electron Microscopy in Materials Science

Early Results from an Aberration-Corrected JEOL 2200FS STEM/TEM at Oak Ridge National Laboratory


Douglas A.  Blom  a1 c1 , Lawrence F.  Allard  a1 , Satoshi  Mishina  a2 and Michael A.  O'Keefe  a3
a1 Oak Ridge National Laboratory, Materials Science & Technology Division, 1 Bethel Valley Road, Oak Ridge, TN 37831–6064, USA
a2 JEOL USA, 11 Dearborn Rd., Peabody, MA 01960, USA
a3 Materials Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA

Article author query
blom da   [PubMed][Google Scholar] 
allard lf   [PubMed][Google Scholar] 
mishina s   [PubMed][Google Scholar] 
okeefe ma   [PubMed][Google Scholar] 

Abstract

The resolution-limiting aberrations of round electromagnetic lenses can now be successfully overcome via the use of multipole element “aberration correctors.” The installation and performance of a hexapole-based corrector (CEOS GmbH) integrated on the probe-forming side of a JEOL 2200FS FEG STEM/TEM is described. For the resolution of the microscope not to be severely compromised by its environment, a new, specially designed building at Oak Ridge National Laboratory has been built. The Advanced Microscopy Laboratory was designed with the goal of providing a suitable location for aberration-corrected electron microscopes. Construction methods and performance of the building are discussed in the context of the performance of the microscope. Initial performance of the microscope on relevant specimens and modifications made to eliminate resolution-limiting conditions are also discussed.

(Received January 9 2006)
(Accepted July 13 2006)


Key Words: aberration-corrected scanning transmission electron microscopy; high-angle annular dark-field imaging; single atom imaging; atomic resolution.

Correspondence:
c1 Corresponding author. E-mail: blomda@ornl.gov