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Experiments on high-power ion beam generationin self-insulated diodes

Published online by Cambridge University Press:  09 March 2009

V. M. Bystritskii ,
Yu. A. Glyshko ,
A. A. Sinebrjukhov  and
A. V. Kharlov
V. M. Bystritskii
Affiliation:
Institute of Electrophysics, 620219, Sverdlovsk, USSR
Yu. A. Glyshko
Affiliation:
Institute of Electrophysics, 620219, Sverdlovsk, USSR
A. A. Sinebrjukhov
Affiliation:
Institute of Electrophysics, 620219, Sverdlovsk, USSR
A. V. Kharlov
Affiliation:
Institute of Electrophysics, 620219, Sverdlovsk, USSR
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Abstract

Experimental results are given on high-power ion beams (HPIB) generation in a vacuumspherical focusing diode with self-magnetic insulation, obtained from the nanosecond accelerator PARUS with 0.2-TW power and 60-ns pulse duration for a matched load. When the passive plasma source of the ions was used, the efficiency of the HPIB generationwas measured to be as high as 20% for 700-kV diode voltage and 10-kA/cm2 beam density in the focal plane.

The application of a coaxial plasma opening switch (POS) prior to the diode resultedin a factor-of-1.8 increase in the diode power in comparison with a match operation inthe absence of a POS.

Type
Research Article
Information
Laser and Particle Beams , Volume 9 , Issue 3 , September 1991 , pp. 691 - 698
Copyright
Copyright © Cambridge University Press 1991

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References

REFERENCES

Bergeron, K. D. 1983 Appl. Phys. Lett. 28, 306.CrossRefGoogle Scholar
Bystritskii, V. M. & Didenko, A. N. 1984 High Power Ion Beams (Atomizdat, Moscow).Google Scholar
Bystritskii, V. M. et al. 1988 In Proceedings of the 7th Allunion Symposium on High Current Electronics,Tomsk, USSR, Vol. 2, p. 124.Google Scholar
Vandevender, J. P. et al. 1981 J. Appl. Phys. 53, 4.CrossRefGoogle Scholar
Vandevender, J. P. et al. 1985 Laser Part. Beams 3, 93.CrossRefGoogle Scholar
Yatsui, K. et al. 1986 In Proceedings of the 2nd International Conference on Plasma Physics and Controlled Fusion,Los Alamos, NM, pp. 177–185.Google Scholar