Microscopy and Microanalysis



Invited Paper


Advances in Instrumentation and Techniques - Accessorizing the SEM

World Trade Center Particulate Contamination Signature


S R Badger a1, K P Rickabaugh a1, M S Potter a1, B E Scheetz a2, H R Bhattacharjee a1 and R J Lee a1
a1 RJ Lee Group, Monroeville, Pennsylvania
a2 Pennsylvania State University

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.