Hostname: page-component-76fb5796d-qxdb6 Total loading time: 0 Render date: 2024-04-26T09:36:34.459Z Has data issue: false hasContentIssue false
  • English
  • Français

High-Resolution TEM and the Application of Direct and Indirect Aberration Correction

Published online by Cambridge University Press:  03 January 2008

Crispin J.D. Hetherington ,
Lan-Yun Shery Chang ,
Sarah Haigh ,
Peter D. Nellist ,
Lionel Cervera Gontard ,
Rafal E. Dunin-Borkowski  and
Angus I. Kirkland
Crispin J.D. Hetherington
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Lan-Yun Shery Chang
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Sarah Haigh
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Peter D. Nellist
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Lionel Cervera Gontard
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ, UK Now at: Centre for Electron Nanoscopy, Technical University of Denmark, DK-2800 Kongens Lyngby, Denmark
Rafal E. Dunin-Borkowski
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ, UK Now at: Centre for Electron Nanoscopy, Technical University of Denmark, DK-2800 Kongens Lyngby, Denmark
Angus I. Kirkland
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK
Get access

Abstract

Aberration correction leads to a substantial improvement in the directly interpretable resolution of transmission electron microscopes. Correction of the aberrations has been achieved electron-optically through a hexapole-based corrector and also indirectly by computational analysis of a focal or tilt series of images. These direct and indirect methods are complementary, and a combination of the two offers further advantages. Materials characterization has benefitted from the reduced delocalization and higher resolution in the corrected images. It is now possible, for example, to locate atomic columns at surfaces to higher accuracy and reliability. This article describes the JEM-2200FS in Oxford, which is equipped with correctors for both the image-forming and probe-forming lenses. Examples of the use of this instrument in the characterization of nanocrystalline catalysts are given together with initial results combining direct and indirect methods. The double corrector configuration enables direct imaging of the corrected probe, and a potential confocal imaging mode is described. Finally, modifications to a second generation instrument are outlined.

Keywords

aberration correctionnanocrystalline catalysisconfocal imagingexit-wavefunction reconstruction
Type
Research Article
Information
Microscopy and Microanalysis , Volume 14 , Issue 1: Special Issue: Materials Research in an Aberration-Free Environment , February 2008 , pp. 60 - 67
Copyright
© 2008 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Cervera Gontard, L., Chang, L.-Y., Hetherington, C.J.D., Kirkland, A.I., Ozkaya, D. & Dunin-Borkowski, R.E. (2007). Aberration-correction imaging of active sites on industrial catalyst nanoparticles. Angew Chem 46, 3683–3685.Google Scholar
Chang, L.-Y., Chen, F.-R., Kirkland, A.I. & Kai, J.J. (2003). Calculations of spherical aberration-corrected imaging behaviour. J Electron Microsc 52, 359–364.Google Scholar
Coene, W.M.J., Thust, A., Op De Beeck, M. & Van Dyck, D. (1996). Maximum-likelihood method for focus-variation image reconstruction in high resolution transmission electron microscopy. Ultramicroscopy 64, 109–135.Google Scholar
Eizenberg, M. & Blakely, J.M. (1979). Carbon interaction with nickel surfaces: Monolayer formation and structural stability. J Chem Phys 71, 3467–3477.Google Scholar
Haider, M., Rose, H., Uhlemann, S., Kabius, B. & Urban, K. (1998a). Electron microscopy image enhanced. Nature 392, 768–769.Google Scholar
Haider, M., Rose, H., Uhlemann, S., Schwan, E., Kabius, B. & Urban, K. (1998b). A spherical aberration corrected 200kV transmission electron microscope. Ultramicroscopy 75, 53–60.Google Scholar
Haigh, S., Kirkland, A.I. & Chang, L.Y. (2006). Aberration corrected tilt series reconstruction. In Proceedings of 16th International Microscopy Congress, Sapporo. Ichinose, H. & Sasaki, T. (Eds.), p. 943. Sapporo, Japan: Japanese Society for Electron Microscopy.
Hutchison, J.L., Titchmarsh, J.M., Cockayne, D.J.H., Doole, R.C., Hetherington, C.J.D., Kirkland, A.I. & Sawada, H. (2005). A versatile double aberration-corrected, energy filtered TEM/STEM for materials science. Ultramicroscopy 103, 7–15.Google Scholar
Kirkland, A.I. & Meyer, R.R. (2004). “Indirect” high-resolution transmission electron microscopy: Aberration measurement and wavefunction reconstruction. Microsc Microanal 10, 401–413.Google Scholar
Kirkland, A.I., Meyer, R.R. & Chang, L.-Y.S. (2006). Local measurement and computational refinement of aberrations for HRTEM. Microsc Microanal 12, 461–468.Google Scholar
Kirkland, A.I., Saxton, W.O., Chau, K.L., Tsuno, K. & Kawasaki, M. (1995). Super-resolution by aperture synthesis: Tilt series reconstruction in CTEM. Ultramicroscopy 57, 355–374.Google Scholar
Kuglin, C.D. & Hines, D.C. (1975). The phase correlation image alignment method. In Proceedings of the IEEE International Conference on Cybernetics and Society, pp. 163–165. New York: IEEE.
Lentzen, M. (2006). Progress in aberration-corrected high-resolution transmission electron microscopy using hardware aberration correction. Microsc Microanal 12, 191–205.Google Scholar
Lentzen, M., Jahnen, B., Jia, C.L., Thust, A., Tillmann, K. & Urban, K. (2002). High-resolution imaging with an aberration-corrected transmission electron microscope. Ultramicroscopy 92, 233–242.Google Scholar
Lichte, H. (1991). Electron image plane off-axis holography of atomic structures. Adv Opt Elect Microsc 12, 25.Google Scholar
Lin, J.A. & Cowley, J.M. (1986). Calibration of the operating parameters for an HB5 STEM instrument. Ultramicroscopy 19, 31–42.Google Scholar
Meyer, R.R., Kirkland, A.I., Dunin-Borkowski, R.E. & Hutchison, J.L. (2000). Experimental characterization of CCD cameras for HREM at 300kV. Ultramicroscopy 85, 9–13.Google Scholar
Meyer, R., Kirkland, A. & Saxton, W. (2002). A new method for the determination of the wave aberration function for high resolution TEM. 1. Measurement of the symmetric aberrations. Ultramicroscopy 92, 89–109.Google Scholar
Meyer, R., Kirkland, A. & Saxton, W. (2004). A new method for the determination of the wave aberration function for high resolution TEM. 2. Measurement of the antisymmetric aberrations. Ultramicroscopy 99, 115–123.Google Scholar
Mukai, M., Kaneyama, T., Tomita, T., Tsuno, K., Terauchi, M., Tsuda, K., Naruse, M., Honda, T. & Tanaka, M. (2005). Performance of a new monochromator for a 200 kV analytical electron microscope. Microsc Microanal 11(Suppl. 2), 2134–2135.Google Scholar
Nellist, P.D., Behan, G., Kirkland, A.I. & Hetherington, C.J.D. (2006). Confocal operation of a transmission electron microscope with two aberration correctors. Appl Phys Lett 89, 124105.Google Scholar
Sawada, H., Tomita, T., Naruse, M., Honda, T., Hambridge, P., Hartel, P., Haider, M., Hetherington, C., Doole, R., Kirkland, A., Hutchison, J., Titchmarsh, J. & Cockayne, D. (2005). Experimental evaluation of a spherical aberration-corrected TEM and STEM. J Electron Microsc 54, 119–121.Google Scholar
Saxton, W.O. (1988). Accurate atom positions from focal and tilted beam series of high resolution electron micrographs. In Image and Signal Processing in Electron Microscopy. Proceedings of the 6th Pfefferkorn Conference, Niagara, Hawkes, P.W., Ottensmeyer, F.P., Saxton, W.O. & Rosenfeld, A. (Eds.), pp. 213–224. Chicago: Scanning Microscopy International.
Scherzer, O. (1947). Sphärische und chromatische Korrektur von Elektronen-Linsen. Optik 2, 114–132.Google Scholar
Tillmann, K., Thust, A. & Urban, K. (2004). Spherical aberration correction in tandem with exit-plane wave function reconstruction: Interlocking tools for the atomic scale imaging of lattice defects in GaAs. Microsc Microanal 10, 185–198.Google Scholar
Typke, D. & Dierksen, K. (1995). Determination of image aberrations in high resolution electron microscopy using diffractogram and cross-correlation methods. Optik 99, 155–166.Google Scholar
Uhlemann, S. & Haider, M. (1998). Residual wave aberrations in the first spherical aberration corrected transmission electron microscope. Ultramicroscopy 72, 109–119.Google Scholar
Van Benthem, K., Lupini, A.R., Kim, M., Baik, H.S., Doh, S., Lee, J.-H., Oxley, M.P., Findlay, S.D., Allen, L.J., Luck, J.T. & Pennycook, S.J. (2005). Three-dimensional imaging of individual hafnium atoms inside a semiconductor device. Appl Phys Lett 87, 034104.Google Scholar
Zemlin, F. (1979). A practical procedure for alignment of a high resolution electron microscope. Ultramicroscopy 4, 241–245.Google Scholar
Zemlin, F., Weiss, K., Schiske, P., Kunath, W. & Herrmann, K.-H. (1978). Coma-free alignment of high resolution electron microscopes with the aid of optical diffractograms. Ultramicroscopy 3, 49–60.Google Scholar