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Plasma Emission Spectroscopy and Chemical Analysis of Amorphous Hydrogenated Carbon

Published online by Cambridge University Press:  28 February 2011

Chang Soo Park ,
Jeffrey R. Bodart ,
He-Xiang Han  and
Bernard J. Feldman
Chang Soo Park
Affiliation:
University of Missouri-St.Louis, Department of Physics, St.Louis, MO 631212
Jeffrey R. Bodart
Affiliation:
University of Missouri-St.Louis, Department of Physics, St.Louis, MO 631212
He-Xiang Han
Affiliation:
Permanent Address: Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China
Bernard J. Feldman
Affiliation:
University of Missouri-St.Louis, Department of Physics, St.Louis, MO 631212
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Abstract

The emission spectra of various hydrocarbon plasmas used in the growth of amorphous hydrogenated carbon (α-C:H) thin films have been measured.The presence of CH, H, H2, and C2 species in the plasma have been observed.The chemical composition of the α-C:H films was determined by combustion analysis and shows roughly equal atomic concentrations of H and C and a surprising large concentration of 0.The plasma emission spectra and chemical composition results can be partially understood in terms of relative bond strengths of the different molecules involved, and these results give some insights into the growth kinetics of α-C:H thin films.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 68: Symposium C – Plasma Processing , 1986 , 199
Copyright
Copyright © Materials Research Society 1986

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