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LEEM / PEEM Study of Anisotropic Diffusion Fields in the Ag/Si(001) System

Published online by Cambridge University Press:  01 February 2011

Dirk Wall ,
Kelly Ryan Roos ,
Michael Horn-von Hoegen  and
Frank-Joachim Meyer zu Heringdorf
Dirk Wall
Affiliation:
dirk.wall@uni-due.de, University of Duisburg-Essen, Physics, Lotharstrasse 1, Duisburg, 47057, Germany
Kelly Ryan Roos
Affiliation:
rooster@bradley.edu, Bradley University, Department of Physics, 1501 West Bradley Avenue, Peoria, IL, 61625, United States
Michael Horn-von Hoegen
Affiliation:
horn-von-hoegen@uni-due.de, Universität Duisburg-Essen, Department of Physics and Center for Nanointegration Duisburg-Essen (CeNIDE), Lotharstrasse 1, Duisburg, 47057, Germany
Frank-Joachim Meyer zu Heringdorf
Affiliation:
meyerzh@uni-due.de, Universität Duisburg-Essen, Department of Physics and Center for Nanointegration Duisburg-Essen (CeNIDE), Lotharstrasse 1, Duisburg, 47057, Germany
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Abstract

We used direct imaging of diffusion fields in photoemission electron microscopy to study the diffusion (an)isotropy of Ag on flat and vicinal Si(001) surfaces with miscut angles between 0.2° and 4° in the [110] direction. While the diffusion field, represented by its iso-coverage zone, is isotropic on flat Si(001), it becomes elongated on the vicinal surface. The aspect ratio of the iso-coverage zone is used as a measure of the effective diffusion anisotropy on the surface. The aspect ratio of the iso-coverage zone increases continuously with the miscut angle, up to the maximum miscut that was studied. For the 4° miscut surface we find that the shape of the diffusion field is independent of the kink density of the substrate. From the temperature dependence of the aspect ratio, we determine an effective energy of ΔEani ∼ 0.7 eV for the activation energy responsible for the anisotropy.

Keywords

diffusionAgSi
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1088: Symposium W – Advances and Applications of Surface Electron Microscopy , 2008 , 1088-W05-04
Copyright
Copyright © Materials Research Society 2008

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