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Disassembling Glancing Angle Deposited Films for High-Throughput, Single-Post Growth Scaling Measurements

Published online by Cambridge University Press:  15 October 2012

Joshua Morgan Arthur Siewert*
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada
Joshua Michael LaForge
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada
Michael Thomas Taschuk
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada
Michael Julian Brett
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada NRC National Institute for Nanotechnology, Edmonton, AB T6G 2M9, Canada
*
*Corresponding author. E-mail: jsiewert@ualberta.ca
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Abstract

With growing interest in nanostructured thin films produced by glancing angle deposition (GLAD), it becomes increasingly important to understand their overall growth mechanics and nanocolumn structure. We present a new method of isolating the individual nanocolumns of GLAD films, facilitating automated measurement of their broadening profiles. Data collected for α = 81° TiO2 vertical nanocolumns deposited across a range of substrate rotation rates demonstrates that these rates influence growth scaling parameters. Further, individual posts were found in each case that violate predicted Kardar-Parisi-Zhang growth scaling limits. The technique's current iteration is comparable to existing techniques in speed: though data were studied from 10,756 individual objects, the majority could not be confidently used in subsequent analysis. Further refinement may allow high-throughput automated film characterization and permit close examination of subtle growth trends, potentially enhancing control over GLAD film broadening and morphology.

Type
Materials Applications
Copyright
Copyright © Microscopy Society of America 2012

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