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Early Results from an Aberration-Corrected JEOL 2200FS STEM/TEM at Oak Ridge National Laboratory

Published online by Cambridge University Press:  11 October 2006

Douglas A. Blom
Affiliation:
Oak Ridge National Laboratory, Materials Science & Technology Division, 1 Bethel Valley Road, Oak Ridge, TN 37831–6064, USA
Lawrence F. Allard
Affiliation:
Oak Ridge National Laboratory, Materials Science & Technology Division, 1 Bethel Valley Road, Oak Ridge, TN 37831–6064, USA
Satoshi Mishina
Affiliation:
JEOL USA, 11 Dearborn Rd., Peabody, MA 01960, USA
Michael A. O'Keefe
Affiliation:
Materials Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA
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Abstract

The resolution-limiting aberrations of round electromagnetic lenses can now be successfully overcome via the use of multipole element “aberration correctors.” The installation and performance of a hexapole-based corrector (CEOS GmbH) integrated on the probe-forming side of a JEOL 2200FS FEG STEM/TEM is described. For the resolution of the microscope not to be severely compromised by its environment, a new, specially designed building at Oak Ridge National Laboratory has been built. The Advanced Microscopy Laboratory was designed with the goal of providing a suitable location for aberration-corrected electron microscopes. Construction methods and performance of the building are discussed in the context of the performance of the microscope. Initial performance of the microscope on relevant specimens and modifications made to eliminate resolution-limiting conditions are also discussed.

Type
Research Article
Copyright
© 2006 Microscopy Society of America

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References

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