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Mass flow and tangential momentum accommodation in silicon micromachined channels

Published online by Cambridge University Press:  22 June 2001

ERROL B. ARKILIC
Affiliation:
Phasyn, San Carlos, CA 94070, USA
KENNETH S. BREUER
Affiliation:
Division of Engineering, Brown University, Providence RI 02912, USA
MARTIN A. SCHMIDT
Affiliation:
Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA 02139, USA

Abstract

High-precision experimental results are reported showing the tangential momentum accommodation coefficient (TMAC) for several gases in contact with single-crystal silicon to be less than unity. A precise and robust experimental platform is demonstrated for measurement of mass flows through silicon micromachined channels due to an imposed pressure gradient. Analytic expressions for isothermal Maxwellian slip flows through long channels are used to determine the TMAC at a variety of Knudsen numbers. Results from experiments using nitrogen, argon and carbon dioxide are presented. For all three gases the TMAC is found to be lower than one, ranging from 0.75 to 0.85.

Type
Research Article
Copyright
© 2001 Cambridge University Press

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